G. Boehm, S. Sprengel, K. Vizbaras, C. Grasse, T. Gruendl, R. Meyer, M. Amann
{"title":"2和4µm之间的光发射:创新的有源区域设计,用于基于InP和gasb的器件","authors":"G. Boehm, S. Sprengel, K. Vizbaras, C. Grasse, T. Gruendl, R. Meyer, M. Amann","doi":"10.1109/ICIPRM.2013.6562609","DOIUrl":null,"url":null,"abstract":"This work shows different approaches to cover the spectral range from 2 to 4 μm with active regions based on InP and GaSb for devices suitable as light sources for gas-sensing applications. For shorter wavelengths up to 2.3 μm type-I InP-based quantum wells with rectangular and triangular shape are the preferred choice, beyond that GaSb-based type-I active regions were studied to cover the wavelengths up to 4 μm. An alternative method is implementing type-II structures on InP to exploit the advantages of this well-known material system for device fabrication. For the different methods device designs, growth issues and applications will be discussed.","PeriodicalId":120297,"journal":{"name":"2013 International Conference on Indium Phosphide and Related Materials (IPRM)","volume":null,"pages":null},"PeriodicalIF":0.0000,"publicationDate":"2013-05-19","publicationTypes":"Journal Article","fieldsOfStudy":null,"isOpenAccess":false,"openAccessPdf":"","citationCount":"1","resultStr":"{\"title\":\"Light emission between 2 and 4 µm: Innovative active region designs for InP- and GaSb-based devices\",\"authors\":\"G. Boehm, S. Sprengel, K. Vizbaras, C. Grasse, T. Gruendl, R. Meyer, M. Amann\",\"doi\":\"10.1109/ICIPRM.2013.6562609\",\"DOIUrl\":null,\"url\":null,\"abstract\":\"This work shows different approaches to cover the spectral range from 2 to 4 μm with active regions based on InP and GaSb for devices suitable as light sources for gas-sensing applications. For shorter wavelengths up to 2.3 μm type-I InP-based quantum wells with rectangular and triangular shape are the preferred choice, beyond that GaSb-based type-I active regions were studied to cover the wavelengths up to 4 μm. An alternative method is implementing type-II structures on InP to exploit the advantages of this well-known material system for device fabrication. For the different methods device designs, growth issues and applications will be discussed.\",\"PeriodicalId\":120297,\"journal\":{\"name\":\"2013 International Conference on Indium Phosphide and Related Materials (IPRM)\",\"volume\":null,\"pages\":null},\"PeriodicalIF\":0.0000,\"publicationDate\":\"2013-05-19\",\"publicationTypes\":\"Journal Article\",\"fieldsOfStudy\":null,\"isOpenAccess\":false,\"openAccessPdf\":\"\",\"citationCount\":\"1\",\"resultStr\":null,\"platform\":\"Semanticscholar\",\"paperid\":null,\"PeriodicalName\":\"2013 International Conference on Indium Phosphide and Related Materials (IPRM)\",\"FirstCategoryId\":\"1085\",\"ListUrlMain\":\"https://doi.org/10.1109/ICIPRM.2013.6562609\",\"RegionNum\":0,\"RegionCategory\":null,\"ArticlePicture\":[],\"TitleCN\":null,\"AbstractTextCN\":null,\"PMCID\":null,\"EPubDate\":\"\",\"PubModel\":\"\",\"JCR\":\"\",\"JCRName\":\"\",\"Score\":null,\"Total\":0}","platform":"Semanticscholar","paperid":null,"PeriodicalName":"2013 International Conference on Indium Phosphide and Related Materials (IPRM)","FirstCategoryId":"1085","ListUrlMain":"https://doi.org/10.1109/ICIPRM.2013.6562609","RegionNum":0,"RegionCategory":null,"ArticlePicture":[],"TitleCN":null,"AbstractTextCN":null,"PMCID":null,"EPubDate":"","PubModel":"","JCR":"","JCRName":"","Score":null,"Total":0}
Light emission between 2 and 4 µm: Innovative active region designs for InP- and GaSb-based devices
This work shows different approaches to cover the spectral range from 2 to 4 μm with active regions based on InP and GaSb for devices suitable as light sources for gas-sensing applications. For shorter wavelengths up to 2.3 μm type-I InP-based quantum wells with rectangular and triangular shape are the preferred choice, beyond that GaSb-based type-I active regions were studied to cover the wavelengths up to 4 μm. An alternative method is implementing type-II structures on InP to exploit the advantages of this well-known material system for device fabrication. For the different methods device designs, growth issues and applications will be discussed.