非隔离顶栅对双栅InGaZnO薄膜晶体管性能的影响

C. Zhang, Xiaodong Huang
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引用次数: 0

摘要

非晶材料InGaZnO (IGZO)对空气湿度敏感,导致金属羟基缺陷的形成,引起薄膜晶体管(TFT)的稳定性问题。在本工作中,通过在IGZO层上直接沉积金属层来抑制稳定性问题。此外,当在IGZO半导体层上沉积Ti金属层时,器件的迁移率得到了改善。所提出的TFT显示了在有源矩阵液晶显示器(amlcd)像素单元中作为开关元件的潜力。
本文章由计算机程序翻译,如有差异,请以英文原文为准。
Effects of Unisolated Top Gate on Performance of Dual-Gate InGaZnO Thin-Film Transistor
The amorphous material InGaZnO (IGZO) is sensitive to air humidity, resulting in the formation of metal-hydroxyl defects and causing stability issue of thin-film transistor (TFT). The stability issue is suppressed by depositing a metal layer directly on the IGZO layer in this work. Moreover, the mobility of the device is improved when a Ti metal layer is deposited on the IGZO semiconductor layer. The proposed TFT shows potential for switching element in Active Matrix Liquid Crystal Displays (AMLCDs) pixel unit.
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