利用吸气剂防止砷化镓器件退化

R. Mohanty, K. Gilleo
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引用次数: 1

摘要

采用工业栅金属化结构的含有砷化镓(GaAs)和射频吸收剂的密封半导体器件已被证明在环境和环境条件下浸出氢,从而毒害并缩短器件的寿命。本文介绍了氢、湿、微粒吸收剂的制造和应用,解决了这些污染物的降解问题。本文还简要介绍了氢的来源和氢降解装置的机理。
本文章由计算机程序翻译,如有差异,请以英文原文为准。
Preventing degradation of GaAs devices by the use of getter
Hermetically sealed semiconductor devices containing gallium arsenide (GaAs) and RF absorbers, utilizing industry gate metallization structures have been shown to leach out hydrogen in ambient as well as environmental conditioning which poison and shorten the life of the device. This paper describes manufacturing and application of getter for hydrogen, moisture and particulate to solve problem of degradation due to these contaminants. A brief history describing sources of hydrogen and mechanisms for device degradation by hydrogen is also presented in this paper.
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