{"title":"氮流量变化对多晶TiN薄膜反射率光谱、择优取向和化学计量的影响","authors":"M. Zlatanović, D. Dukic, U. Kascak, I. Popović","doi":"10.1109/ICMEL.2000.840569","DOIUrl":null,"url":null,"abstract":"TiN samples were deposited in a DC reactive magnetron deposition system with varying deposition parameters. It was found that slight variations of the nitrogen content during deposition affected preferred growth and composition which strongly influenced optical reflectivity of the investigated samples.","PeriodicalId":215956,"journal":{"name":"2000 22nd International Conference on Microelectronics. Proceedings (Cat. No.00TH8400)","volume":"65 8","pages":"0"},"PeriodicalIF":0.0000,"publicationDate":"2000-05-14","publicationTypes":"Journal Article","fieldsOfStudy":null,"isOpenAccess":false,"openAccessPdf":"","citationCount":"0","resultStr":"{\"title\":\"Variation of reflectivity spectra, preferred orientation and stoichiometry of polycrystalline TiN films due to nitrogen flow variation\",\"authors\":\"M. Zlatanović, D. Dukic, U. Kascak, I. Popović\",\"doi\":\"10.1109/ICMEL.2000.840569\",\"DOIUrl\":null,\"url\":null,\"abstract\":\"TiN samples were deposited in a DC reactive magnetron deposition system with varying deposition parameters. It was found that slight variations of the nitrogen content during deposition affected preferred growth and composition which strongly influenced optical reflectivity of the investigated samples.\",\"PeriodicalId\":215956,\"journal\":{\"name\":\"2000 22nd International Conference on Microelectronics. Proceedings (Cat. No.00TH8400)\",\"volume\":\"65 8\",\"pages\":\"0\"},\"PeriodicalIF\":0.0000,\"publicationDate\":\"2000-05-14\",\"publicationTypes\":\"Journal Article\",\"fieldsOfStudy\":null,\"isOpenAccess\":false,\"openAccessPdf\":\"\",\"citationCount\":\"0\",\"resultStr\":null,\"platform\":\"Semanticscholar\",\"paperid\":null,\"PeriodicalName\":\"2000 22nd International Conference on Microelectronics. Proceedings (Cat. No.00TH8400)\",\"FirstCategoryId\":\"1085\",\"ListUrlMain\":\"https://doi.org/10.1109/ICMEL.2000.840569\",\"RegionNum\":0,\"RegionCategory\":null,\"ArticlePicture\":[],\"TitleCN\":null,\"AbstractTextCN\":null,\"PMCID\":null,\"EPubDate\":\"\",\"PubModel\":\"\",\"JCR\":\"\",\"JCRName\":\"\",\"Score\":null,\"Total\":0}","platform":"Semanticscholar","paperid":null,"PeriodicalName":"2000 22nd International Conference on Microelectronics. Proceedings (Cat. No.00TH8400)","FirstCategoryId":"1085","ListUrlMain":"https://doi.org/10.1109/ICMEL.2000.840569","RegionNum":0,"RegionCategory":null,"ArticlePicture":[],"TitleCN":null,"AbstractTextCN":null,"PMCID":null,"EPubDate":"","PubModel":"","JCR":"","JCRName":"","Score":null,"Total":0}
Variation of reflectivity spectra, preferred orientation and stoichiometry of polycrystalline TiN films due to nitrogen flow variation
TiN samples were deposited in a DC reactive magnetron deposition system with varying deposition parameters. It was found that slight variations of the nitrogen content during deposition affected preferred growth and composition which strongly influenced optical reflectivity of the investigated samples.