ZnO薄膜生长的温度依赖性及其在自供电织物中的应用

D. Elam, R. Kotha, R. Hackworth, A. Ayón, Chonglin Chen, A. Chabanov
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引用次数: 0

摘要

氧化锌薄膜因其广泛的特性和将这些薄膜沉积在有机基板上的能力而变得越来越受欢迎,这些应用包括生物模板,oled或沉积在织物上用于功能化目的,包括可穿戴纺织品的弯曲和变形发电。然而,由于许多织物和其他有机衬底不能在薄膜生长的典型高温下存活,因此表征和理解这些薄膜的性能作为温度沉积和随后的热处理的函数的依赖性是很重要的。本文报道了用原子层沉积法(ALD)制备氧化锌薄膜的性能,以及表面粗糙度、薄膜应力、表面能和晶体结构与沉积温度的关系。
本文章由计算机程序翻译,如有差异,请以英文原文为准。
Temperature dependence of ZnO thin film growth and its application to self-powered fabrics
Zinc oxide thin films are becoming increasingly popular for their wide range of properties and the ability to deposit these films on organic substrates for applications such as biotemplating, OLEDs, or deposition on fabrics for functionalization purposes including power generation from the flexing and deformation of wearable textiles. However, since many fabrics and other organic substrates can not survive the typically high temperatures of thin film growth, it is important to characterize and understand the dependence of the properties of these films as a function of temperature deposition and subsequent thermal treatments. We report on the properties of zinc oxide thin films grown by Atomic Layer Deposition (ALD) and the dependence of surface roughness, film stress, surface energy and crystalline structure on deposition temperature.
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