目前,用于终极传感器和RSFQ数字电路的织构和外延NbN超导层的研究进展

J. Miller, N. Hadacek, C. Jorel, J. Thomassin, V. Bouchiat, M. Faucher, P. Febvre, A. Rousy, G. Lamura
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引用次数: 5

摘要

氮化物超导体,特别是氮化铌是发展高性能光电和数字电路的关键材料。我们提出了一种在r平面蓝宝石或MgO衬底上实现这种高频器件的方法。通过在300-600°C范围内加热的衬底上溅射,可以获得Tc高于10 K、低且可重复的穿透深度(λ L ~ 250 nm)和表面电阻(Rs)值高达1太赫兹的薄而扁平的NbN薄膜。简单的亚微米尺寸的HEB桥结构,即使在非常薄(2-5纳米厚)的NbN层中也可以提供低于30 ps的松弛时间。然后可以实现快速光电数据链路和具有高时钟频率NbN RSFQ数字电路的片上传感器。
本文章由计算机程序翻译,如有差异,请以英文原文为准。
Now developments in textured and epitaxial NbN superconducting layers for ultimate sensors and RSFQ digital circuits
Nitride superconductors and specially niobium nitride are key materials for developing high performance optoelectronic and digital circuits. We are presenting a way to achieve such high frequency devices on R-plane sapphire or MgO substrates. Deposition of thin and flat NbN films with Tc above 10 K, low and reproducible penetration depth (λ L ∼250 nm) and surface resistance (Rs) values up to I THz, is required and obtained by sputtering on a substrate heated in the 300-600°C range. Simple sub-micrometer size HEB bridge structures where patterned even in a very thin (2-5 nm thick) NbN layers offering relaxation times below 30 ps. It is then possible to achieve fast optoelectronic data links and sensors on-chip with high clock frequency NbN RSFQ digital circuits.
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