M. Sharma, J. Campbell, H. Choe, C. Kuo, E. Prinz, R. Raghunathan, P. Gardner, L. Avery
{"title":"深亚微米ULSI电路的ESD保护方案","authors":"M. Sharma, J. Campbell, H. Choe, C. Kuo, E. Prinz, R. Raghunathan, P. Gardner, L. Avery","doi":"10.1109/VLSIT.1995.520870","DOIUrl":null,"url":null,"abstract":"The paper describes a robust scheme for on-chip protection of sub-micron ULSI circuits against ESD stress using a novel (low voltage) zener-triggered SCR, and a zener-triggered thin gate oxide MOSFET. The devices are implemented in state of the art, 3.3 V, 0.5 /spl mu/m feature site dual-poly, full-SALICIDE technology. The trigger and holding voltages of the described ESD protection elements are tunable over wide operating ranges and the devices trigger consistently and predictably at pre-determined values suitable for sub-micron technologies. The effectiveness of this methodology in providing ESD protection up to 15 kV is successfully demonstrated.","PeriodicalId":328379,"journal":{"name":"1995 Symposium on VLSI Technology. Digest of Technical Papers","volume":"349 1","pages":"0"},"PeriodicalIF":0.0000,"publicationDate":"1995-06-06","publicationTypes":"Journal Article","fieldsOfStudy":null,"isOpenAccess":false,"openAccessPdf":"","citationCount":"4","resultStr":"{\"title\":\"An ESD protection scheme for deep sub-micron ULSI circuits\",\"authors\":\"M. Sharma, J. Campbell, H. Choe, C. Kuo, E. Prinz, R. Raghunathan, P. Gardner, L. Avery\",\"doi\":\"10.1109/VLSIT.1995.520870\",\"DOIUrl\":null,\"url\":null,\"abstract\":\"The paper describes a robust scheme for on-chip protection of sub-micron ULSI circuits against ESD stress using a novel (low voltage) zener-triggered SCR, and a zener-triggered thin gate oxide MOSFET. The devices are implemented in state of the art, 3.3 V, 0.5 /spl mu/m feature site dual-poly, full-SALICIDE technology. The trigger and holding voltages of the described ESD protection elements are tunable over wide operating ranges and the devices trigger consistently and predictably at pre-determined values suitable for sub-micron technologies. The effectiveness of this methodology in providing ESD protection up to 15 kV is successfully demonstrated.\",\"PeriodicalId\":328379,\"journal\":{\"name\":\"1995 Symposium on VLSI Technology. Digest of Technical Papers\",\"volume\":\"349 1\",\"pages\":\"0\"},\"PeriodicalIF\":0.0000,\"publicationDate\":\"1995-06-06\",\"publicationTypes\":\"Journal Article\",\"fieldsOfStudy\":null,\"isOpenAccess\":false,\"openAccessPdf\":\"\",\"citationCount\":\"4\",\"resultStr\":null,\"platform\":\"Semanticscholar\",\"paperid\":null,\"PeriodicalName\":\"1995 Symposium on VLSI Technology. Digest of Technical Papers\",\"FirstCategoryId\":\"1085\",\"ListUrlMain\":\"https://doi.org/10.1109/VLSIT.1995.520870\",\"RegionNum\":0,\"RegionCategory\":null,\"ArticlePicture\":[],\"TitleCN\":null,\"AbstractTextCN\":null,\"PMCID\":null,\"EPubDate\":\"\",\"PubModel\":\"\",\"JCR\":\"\",\"JCRName\":\"\",\"Score\":null,\"Total\":0}","platform":"Semanticscholar","paperid":null,"PeriodicalName":"1995 Symposium on VLSI Technology. Digest of Technical Papers","FirstCategoryId":"1085","ListUrlMain":"https://doi.org/10.1109/VLSIT.1995.520870","RegionNum":0,"RegionCategory":null,"ArticlePicture":[],"TitleCN":null,"AbstractTextCN":null,"PMCID":null,"EPubDate":"","PubModel":"","JCR":"","JCRName":"","Score":null,"Total":0}
An ESD protection scheme for deep sub-micron ULSI circuits
The paper describes a robust scheme for on-chip protection of sub-micron ULSI circuits against ESD stress using a novel (low voltage) zener-triggered SCR, and a zener-triggered thin gate oxide MOSFET. The devices are implemented in state of the art, 3.3 V, 0.5 /spl mu/m feature site dual-poly, full-SALICIDE technology. The trigger and holding voltages of the described ESD protection elements are tunable over wide operating ranges and the devices trigger consistently and predictably at pre-determined values suitable for sub-micron technologies. The effectiveness of this methodology in providing ESD protection up to 15 kV is successfully demonstrated.