无掺杂CMOS:一个新的器件概念

Frank Wessely, Tillmann A. Krauss, U. Schwalke
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引用次数: 5

摘要

在本文中,我们报告了一种新开发的基于多栅极纳米线(NW)的场效应器件(NWFET),其中晶体管类型可以通过应用控制电压自由选择,增加了集成电路制造中的设计灵活性。此外,NWFET的中隙肖特基势垒源极和漏极触点使其在高温环境中适用于美国,因为该器件同时具有高温稳定性和低off状态电流。这使得NWFET成为许多特定电路应用的多用途器件。
本文章由计算机程序翻译,如有差异,请以英文原文为准。
Dopant-free CMOS: A new device concept
In this paper we report on a newly developed multigate nanowire (NW) based field-effect device (NWFET) where the transistor type is freely selectable by the application of a control-voltage, adding to design flexibility in integrated circuit fabrication. Moreover, the midgap Schottky-barrier source and drain contacts of the NWFET make it feasible for the usa in high temperature environments, since the devices posses both stability against high temperatures and low OFF-state current at the same time. This makes the presented NWFET a multi-purpose device for many specific circuit applications.
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