使用碳纳米管转移进行电互连的细间距碳纳米管束组装

Lingbo Zhu, Kyoung-sik Moon, D. Hess, C. Wong
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引用次数: 8

摘要

碳纳米管(CNTs)已被提出作为微电子器件中的电气互连材料,以解决诸如应力、电迁移和散热等问题。对于电子器件和封装应用,化学气相沉积(CVD)方法特别有吸引力,因为碳纳米管生长的特点,如选择性空间生长,大面积沉积能力和排列碳纳米管生长。然而,CVD技术有几个缺点。将碳纳米管应用于电路的主要挑战之一是高生长温度(~ 600°C)。这样的温度与微电子工艺是不相容的。为了制造包含碳纳米管块的微电子器件,碳纳米管应该选择性地定位并连接到其他材料,如金属电极或键合垫。然而,CNTs与衬底之间的粘附性通常很差,这将导致长期可靠性问题和高接触电阻。为了克服这些缺点,我们提出了一种方法,我们称之为“碳纳米管转移技术”。独特的碳纳米管转移技术的特点是分离碳纳米管生长和碳纳米管器件组装在焊料回流温度。在本文中,我们结合了我们在良好对齐开放式碳纳米管束生长方面的专业知识和碳纳米管转移过程,以组装用于细间距互连应用的碳纳米管束。开放式多壁碳纳米管阵列比封闭式碳纳米管可以携带更高的电流密度,因为内壁可以参与电传输。我们首次开发了一种原位工艺,通过水辅助选择性蚀刻来生长排列良好的碳纳米管束。该工艺效率高,碳纳米管生长速率可达80 μm/min。为了验证转移工艺组装细间距碳纳米管束的可行性,分别在铜基板上组装了直径为25 μm、宽高比为4 μm和间距为80 μm的碳纳米管束。测得的长CNTs的电阻率为~ 2.3×10−4 Ω-cm。由于毛细力的作用,Sn/Pb在开放式碳纳米管薄膜上的润湿性能得到了改善。利用焊料回流工艺实现碳纳米管与金属电极的互连是非常理想的。利用扫描电镜对cnt -焊料界面进行了分析。结果表明,熔融SnPb焊料与CNTs形成了牢固的机械结合。总体而言,碳纳米管转移技术的优势体现在低工艺温度,附着力改善以及将碳纳米管束转移到不同衬底以实现细间距互连应用的可行性。
本文章由计算机程序翻译,如有差异,请以英文原文为准。
Fine-pitch carbon nanotube bundles assembly using CNT transfer for electrical interconnects
Carbon nanotubes (CNTs) have been proposed as electrical interconnects in microelectronic devices to address such problems as stress, electromigration, and heat removal. For electronic device and packaging applications, chemical vapor deposition (CVD) methods are particularly attractive due to characteristic CNT growth features such as selective spatial growth, large area deposition capability and aligned CNT growth. However, the CVD technique suffers from several drawbacks. One of the main challenges for applying CNTs to circuitry is the high growth temperature (≫600°C). Such temperatures are incompatible with microelectronic processes. To fabricate microelectronics devices that incorporate CNT blocks, the CNTs should be selectively positioned and interconnected to other materials such as metal electrodes or bonding pads. However, the adhesion between CNTs and the substrates is usually very poor, which will result in long term reliability issues and high contact resistance. To overcome these disadvantages, we propose a methodology that we term “CNT transfer technology”. The distinctive CNT-transfer-technology features are separation of CNT growth and CNT device assembly at solder reflow temperature. In this paper, we combined our expertise in growth of well-aligned open-ended CNT bundles with the CNT transfer process to assemble CNT bundles for fine-pitch interconnect applications. The open-ended multi-walled CNT arrays could carry higher current density than close-ended CNTs, since the internal walls can participate in the electrical transport. We for the first time developed an in-situ process to grow well aligned CNT bundles by water-assistant selective etching. The process is very efficient, with CNT growth rate of 80 μm/min. To demonstrate the feasibility of transfer process to assemble the fine-pitch CNT bundles, the CNT bundles with diameter, aspect-ratio and pitch of 25 μm, 4, and 80 μm, respectively, were assembled on the copper substrates. The measured resistivity of the long CNTs is ˜ 2.3×10−4 Ω-cm. Due to the capillary force effects, the Sn/Pb show improved wetting properties on open-ended CNT films. It is desirable for CNT interconnect with metal electrode by solder reflow process. The CNT-solder interfaces were analyzed by the SEM. The results indicated that molten SnPb solder form strong mechanical bonding with CNTs. Overall, the advantages of CNT transfer technology are embodied in the low process temperature, adhesion improvement and the feasibility of transferring CNT bundles to different substrates for fine-pitch interconnect applications.
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