晶圆清洗溶液中化学分析的自动在线监测

International Symposium on Semiconductor Manufacturing, Extended Abstracts of ISSM Pub Date : 1900-01-01 DOI:10.1109/ISSM.1994.729453

S. Takaiwa, T. Funabashi, A. Yoshii, T. Iwata

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引用次数: 0

摘要

研制了用于这些清洗液化学分析的连续监测设备。这些分析是由电化学传感探针，如离子选择电极来确定的。该方法能以0的灵敏度测量溶液中各组分的浓度。1 - 1g /L。

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Automated In-line Monitoring Of Chemical Assay In Wafer Cleaning Solution

The continuous monitoring equipment for the chemical assay of these cleaning solution has been developed. These assay are determined by the electrochemical sensing probes such called as ion selective electrodes. With this method, it is able to measure the concentration of components in the solution by the sensitivity of 0. 1 -1 g/L.

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International Symposium on Semiconductor Manufacturing, Extended Abstracts of ISSM

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