砷化镓和硅体1/f噪声的性质(综述)

N. V. D’yakonova, M. Levinshtein, S. L. Rumyantev
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引用次数: 21

摘要

结果表明,半导体中的大块1/f噪声是由于在带边缘附近形成态密度尾的能级占据率的波动而出现的。结果表明,在Hooge参数α=10−4-10−6的纯Si和α=10−4-10−5的n - GaAs中,1/f体噪声的性质由该机制决定。建立了半导体体1/f噪声的现象学模型。该模型很好地解释了所有主要实验数据。该模型预测了一些新的物理效应。所有这些效应都是通过实验观察到的。
本文章由计算机程序翻译,如有差异,请以英文原文为准。
Nature of the bulk 1/f noise in GaAs and Si (review)
It is demonstrated, that the bulk 1/f noise in semiconductors can appear as a result of fluctuations of the occupancy of levels formed density‐of‐states tail near the band edge. It is shown that in pure Si with value of Hooge parameter α=10−4–10−6 and n‐GaAs with α=10−4–10−5 the nature of 1/f bulk noise is determined by this mechanism. Phenomenological model of the bulk 1/f noise in semiconductors is developed. This model explained well all main experimental data. The model predicts some new physical effects. All these effects have been observed experimentally.
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