G. Jan, L. Thomas, S. Le, Yuan-Jen Lee, Huanlong Liu, Jian Zhu, R. Tong, K. Pi, Yu-Jen Wang, D. Shen, R. He, J. Haq, J. Teng, V. Lam, R. Annapragada, T. Zhong, T. Torng, P. Wang
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Demonstration of an MgO based anti-fuse OTP design integrated with a fully functional STT-MRAM at the Mbit level
STT-MRAM technology has been attracting renewed attention since the embedability of a working STT-MRAM design has been demonstrated [1]. In this paper we expand on the versatility of STT-MRAM by demonstrating the conversion of a standard STT-MRAM cell to a One Time Programmable (OTP) anti-fuse cell. Both designs are integrated at the Mbit level on a single chip using the same magnetic stack, processing and CMOS cell design. A single BEOL mask change can convert an STT-MRAM device to an OTP design by simply reducing its size. The increased resistance yields larger voltage drop across the device, due to the voltage divider effect in the 1T-1MTJ cell and is sufficient to trigger reliable dielectric breakdown of the oxide tunnel barrier, effectively shorting the device. In this paper we demonstrate the seamless integration of an OTP based on STT-MRAM and 100% programming and reading yield at the Mbit level.