演示了一种基于MgO的反熔丝OTP设计,该设计集成了Mbit级别的全功能STT-MRAM

G. Jan, L. Thomas, S. Le, Yuan-Jen Lee, Huanlong Liu, Jian Zhu, R. Tong, K. Pi, Yu-Jen Wang, D. Shen, R. He, J. Haq, J. Teng, V. Lam, R. Annapragada, T. Zhong, T. Torng, P. Wang
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引用次数: 2

摘要

自从一个工作的STT-MRAM设计的可嵌入性被证明以来,STT-MRAM技术已经引起了人们的重新关注。在本文中,我们通过演示将标准STT-MRAM单元转换为一次性可编程(OTP)防熔丝单元来扩展STT-MRAM的多功能性。这两种设计都采用相同的磁堆栈、处理和CMOS单元设计,在单个芯片上集成到Mbit级。通过简单地减小STT-MRAM器件的尺寸,单个BEOL掩码更改可以将STT-MRAM器件转换为OTP设计。由于1T-1MTJ电池中的分压器效应,增加的电阻在器件上产生更大的电压降,足以触发氧化物隧道阻挡层的可靠介电击穿,有效地使器件短路。在本文中,我们演示了基于STT-MRAM的OTP与100% Mbit级编程和读取率的无缝集成。
本文章由计算机程序翻译,如有差异,请以英文原文为准。
Demonstration of an MgO based anti-fuse OTP design integrated with a fully functional STT-MRAM at the Mbit level
STT-MRAM technology has been attracting renewed attention since the embedability of a working STT-MRAM design has been demonstrated [1]. In this paper we expand on the versatility of STT-MRAM by demonstrating the conversion of a standard STT-MRAM cell to a One Time Programmable (OTP) anti-fuse cell. Both designs are integrated at the Mbit level on a single chip using the same magnetic stack, processing and CMOS cell design. A single BEOL mask change can convert an STT-MRAM device to an OTP design by simply reducing its size. The increased resistance yields larger voltage drop across the device, due to the voltage divider effect in the 1T-1MTJ cell and is sufficient to trigger reliable dielectric breakdown of the oxide tunnel barrier, effectively shorting the device. In this paper we demonstrate the seamless integration of an OTP based on STT-MRAM and 100% programming and reading yield at the Mbit level.
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