通过退火提高SI-VB GaAs的均匀性

B.E. Freidenreich, K.D. Bronsema, Z. Korzeniowski, B. Nykiel, D. Francomano, J. Moore, R. E. Kremer
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引用次数: 0

摘要

将铸锭退火技术应用于垂直布里奇曼法生长的半绝缘砷化镓。观察到电阻率和迁移率的显著变化。此外,均匀性也有了重大改善。我们针对VB工艺生产的低位错密度砷化镓设计了一种多温铸锭退火工艺。基于砷析出物的溶解和砷的均匀再分布,建立了一个模型来解释我们观察到的退火结果。
本文章由计算机程序翻译,如有差异,请以英文原文为准。
Improved uniformity of SI-VB GaAs by annealing
Ingot annealing has been applied to semi-insulating GaAs grown by the vertical Bridgman (VB) method. Significant changes in resistivity and mobility have been observed. In addition, major improvements in uniformity have also been seen. We have designed a multi-temperature ingot annealing process tailored specifically for the low dislocation density GaAs produced by the VB process. A model has been developed based on the dissolution of As precipitates and uniform redistribution of the arsenic that explains the annealing results we observe.
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