变形硅晶体位错磁性的产生条件和性质

A. V. Brodovoi, V. Kolesnichenko, V. Skorokhod, S. Solonin, S. Koleśnik, V. A. Brodovoi, G. A. Zykov, O. Zinets
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引用次数: 0

摘要

用法拉第法测量了载流子浓度为1.2-1014 cm-3的初始n-Si单晶和单轴变形达11%的n-Si单晶在室温下的磁化率,范围为0.1-4 kOe。发现初始未变形的硅样品为抗磁性样品,磁化率为-2.29- 10-7 cm3g-1,与磁场强度无关。硅晶体中位错的存在从本质上影响磁化率,磁化率对磁场的依赖是强非线性的。利用ESR光谱技术研究了非共振微波响应。观察到微波吸收的迟滞,这是典型的磁有序。本文提出了硅异常磁性能的可能解释,以及这些磁性能与强变形硅微裂纹的出现之间的联系。
本文章由计算机程序翻译,如有差异,请以英文原文为准。
Conditions of arising and nature of the dislocation magnetism of deformed silicon crystals
The magnetic susceptibility of initial n-Si single crystal with the current carrier concentration 1.2-1014 cm-3 and the same crystals after uniaxial deformation up to 11 percent was measured by the Faraday method at room temperature in the range of 0.1-4 kOe. It was found that initial undeformed silicon samples were diamagnetic ones with susceptibility of -2.29- 10-7 cm3g-1 which is independent on the magnetic field strength. The presence of dislocations in silicon crystals essentially influences on the magnetic susceptibility, the dependence of the magnetic susceptibility on the magnetic field being strongly nonlinear. The non-resonance microwave response has been investigated using the ESR spectroscopy technique. The hysteresis of the microwave absorption was observed that is typical for a magnetic ordering. Possible explanation of unusual magnetic properties of silicon and the connection of these property with appearance of microcracks in strongly deformed silicon has been proposed.
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