R. Alcala, F. Mehmood, Pramoda Vishnumurthy, T. Mittmann, T. Mikolajick, U. Schroeder
{"title":"Hf0.5Zr0.5O2基铁电电容器界面氧化层对可靠性性能的影响","authors":"R. Alcala, F. Mehmood, Pramoda Vishnumurthy, T. Mittmann, T. Mikolajick, U. Schroeder","doi":"10.1109/IMW52921.2022.9779287","DOIUrl":null,"url":null,"abstract":"La<inf>2</inf>O<inf>3</inf>, and Al<inf>2</inf>O<inf>3</inf>, were evaluated in the form of interfacial oxide layers as potential modifications to achieve increased electric field cycling endurance and polarization retention in comparison to the parent stand-alone Hf<inf>0.5</inf>Zr<inf>0.5</inf>O<inf>2</inf> capacitor structure. Although it was possible to modify the ferroelectric and conductive behavior of the capacitor, the addition of an interfacial oxide layer also introduced parasitic effects which hampered the improvements. This, nevertheless, was material dependent, with La<inf>2</inf>O<inf>3</inf> outperforming Al<inf>2</inf>O<inf>3</inf>.","PeriodicalId":132074,"journal":{"name":"2022 IEEE International Memory Workshop (IMW)","volume":"169 1","pages":"0"},"PeriodicalIF":0.0000,"publicationDate":"2022-05-01","publicationTypes":"Journal Article","fieldsOfStudy":null,"isOpenAccess":false,"openAccessPdf":"","citationCount":"3","resultStr":"{\"title\":\"Influence of Interfacial Oxide Layers in Hf0.5Zr0.5O2 based ferroelectric capacitors on reliability performance\",\"authors\":\"R. Alcala, F. Mehmood, Pramoda Vishnumurthy, T. Mittmann, T. Mikolajick, U. Schroeder\",\"doi\":\"10.1109/IMW52921.2022.9779287\",\"DOIUrl\":null,\"url\":null,\"abstract\":\"La<inf>2</inf>O<inf>3</inf>, and Al<inf>2</inf>O<inf>3</inf>, were evaluated in the form of interfacial oxide layers as potential modifications to achieve increased electric field cycling endurance and polarization retention in comparison to the parent stand-alone Hf<inf>0.5</inf>Zr<inf>0.5</inf>O<inf>2</inf> capacitor structure. Although it was possible to modify the ferroelectric and conductive behavior of the capacitor, the addition of an interfacial oxide layer also introduced parasitic effects which hampered the improvements. This, nevertheless, was material dependent, with La<inf>2</inf>O<inf>3</inf> outperforming Al<inf>2</inf>O<inf>3</inf>.\",\"PeriodicalId\":132074,\"journal\":{\"name\":\"2022 IEEE International Memory Workshop (IMW)\",\"volume\":\"169 1\",\"pages\":\"0\"},\"PeriodicalIF\":0.0000,\"publicationDate\":\"2022-05-01\",\"publicationTypes\":\"Journal Article\",\"fieldsOfStudy\":null,\"isOpenAccess\":false,\"openAccessPdf\":\"\",\"citationCount\":\"3\",\"resultStr\":null,\"platform\":\"Semanticscholar\",\"paperid\":null,\"PeriodicalName\":\"2022 IEEE International Memory Workshop (IMW)\",\"FirstCategoryId\":\"1085\",\"ListUrlMain\":\"https://doi.org/10.1109/IMW52921.2022.9779287\",\"RegionNum\":0,\"RegionCategory\":null,\"ArticlePicture\":[],\"TitleCN\":null,\"AbstractTextCN\":null,\"PMCID\":null,\"EPubDate\":\"\",\"PubModel\":\"\",\"JCR\":\"\",\"JCRName\":\"\",\"Score\":null,\"Total\":0}","platform":"Semanticscholar","paperid":null,"PeriodicalName":"2022 IEEE International Memory Workshop (IMW)","FirstCategoryId":"1085","ListUrlMain":"https://doi.org/10.1109/IMW52921.2022.9779287","RegionNum":0,"RegionCategory":null,"ArticlePicture":[],"TitleCN":null,"AbstractTextCN":null,"PMCID":null,"EPubDate":"","PubModel":"","JCR":"","JCRName":"","Score":null,"Total":0}
Influence of Interfacial Oxide Layers in Hf0.5Zr0.5O2 based ferroelectric capacitors on reliability performance
La2O3, and Al2O3, were evaluated in the form of interfacial oxide layers as potential modifications to achieve increased electric field cycling endurance and polarization retention in comparison to the parent stand-alone Hf0.5Zr0.5O2 capacitor structure. Although it was possible to modify the ferroelectric and conductive behavior of the capacitor, the addition of an interfacial oxide layer also introduced parasitic effects which hampered the improvements. This, nevertheless, was material dependent, with La2O3 outperforming Al2O3.