氮化硼纳米片电子性能的分析研究

W. Lim, A. Hamzah, M. Ahmadi, R. Ismail
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引用次数: 6

摘要

在后硅时代,探索潜在的半导体材料在纳米电子和光电子领域的应用已经引起了研究人员的极大关注。二维(2D)氮化硼纳米片(BNNS)是候选材料之一,因为它具有与石墨烯相似的结构和卓越的性能,但它保留了几个非凡的特性,特别是在稳定性方面。为了更好地理解BNNS,我们利用最近邻紧密结合(NNTB)模型对BNNS的示意图结构进行了分析研究。电子性质,如色散关系和态密度(DOS)被建模。此外,还研究了现场能量和跳频积分对带结构的影响。结果表明,现场能量对带隙有显著影响,而跳频积分对带结构的形状有重要影响。该模型与已发表的带隙4.57 ~ 4.6 ev的计算结果吻合较好。
本文章由计算机程序翻译,如有差异,请以英文原文为准。
Analytical study of the electronic properties of boron nitride nanosheet
The exploration of potential semiconducting materials for nanoelectronics and optoelectronics applications for post-silicon era has attracted significant attention from researchers. The two-dimensional (2D) boron nitride nanosheet (BNNS) is among the candidates due to its analogous structure and supreme properties with the graphene, and yet, retains several extraordinary characteristics especially in term of its stability. To provide more understandings of the BNNS, the analytical study is carried out based on the schematic structure of BNNS using the Nearest Neighbour Tight Binding (NNTB) model. Electronic properties such as the dispersion relation and the density of state (DOS) are modelled. Furthermore, the impacts of the on-site energy and the hopping integral to the band structure are also studied. The result shows that the on-site energy has a significant effect on the band gap while the hopping integral is accountable for the shape of the band structure. The model exhibits good agreement with the computational published results of the band gap 4.57–4.6eV.
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