超高性能Gaas异质结双极晶体管退化机理研究

Yang-Hua Chang, G. Li, A. Oki, D. Streit, M. Hafizi, M.E. Kim
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引用次数: 0

摘要

只提供摘要形式。最近,当异质结在高水平正向电流注入下受到应力时,电流诱导的V/sub / BE/移位形式的退化已经被报道。虽然V/sub / BE/ shift是器件参数变化的指示,但退化机制不能轻易确定。提出了一种通过测量室温下的I/sub C/反转模式和低温下的I/sub B/正向模式来揭示器件退化机制的方法。倒置I/sub - C/的变化与I/sub - B/的异常分量(隧道电流)之间的相关性被观察到,并归因于铍向取代位的间隙扩散。>
本文章由计算机程序翻译,如有差异,请以英文原文为准。
On the Investigation of Degradation Mechanisms in Ultra-High Performance Gaas Heterojunction Bipolar Transistors
Summary form only given. Recently, current-induced degradation in the form of V/sub BE/ shifts has been reported when the heterojunction is stressed under high-level forward current injection. Although the V/sub BE/ shift is an indication of device parameter change, the degradation mechanisms cannot be readily identified. An approach is presented that uncovers the device degradation mechanisms by measuring the inverted mode I/sub C/ at room temperature and the forward mode I/sub B/ at low temperature. The correlation between the change in the inverted I/sub C/ and an anomalous component (tunneling current) of I/sub B/ is observed and attributed to beryllium interstitial diffusion into substitutional sites. >
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