ULVAC IW-630 200/300mm种植机的工艺性能

Ion Implantation Technology. 2002. Proceedings of the 14th International Conference on Pub Date : 1900-01-01 DOI:10.1109/IIT.2002.1258048

T. Rhoad, B. Lovelace, H. Suzuki, K. Niikura, T. McLaughlin

{"title":"ULVAC IW-630 200/300mm种植机的工艺性能","authors":"T. Rhoad, B. Lovelace, H. Suzuki, K. Niikura, T. McLaughlin","doi":"10.1109/IIT.2002.1258048","DOIUrl":null,"url":null,"abstract":"The process performance for ULVAC's IW-630 200/300 mm medium current ion implanter is reviewed. The IW-630 was designed to ensure high beam parallelism, high-energy purity, and low defect contamination through the use of a ground magnet. The analyses presented include beam parallelism, energy purity, particle contamination, metals contamination, dose uniformity and repeatability.","PeriodicalId":305062,"journal":{"name":"Ion Implantation Technology. 2002. Proceedings of the 14th International Conference on","volume":"19 1","pages":"0"},"PeriodicalIF":0.0000,"publicationDate":"1900-01-01","publicationTypes":"Journal Article","fieldsOfStudy":null,"isOpenAccess":false,"openAccessPdf":"","citationCount":"0","resultStr":"{\"title\":\"Process performance of the ULVAC IW-630 200/300mm implanter\",\"authors\":\"T. Rhoad, B. Lovelace, H. Suzuki, K. Niikura, T. McLaughlin\",\"doi\":\"10.1109/IIT.2002.1258048\",\"DOIUrl\":null,\"url\":null,\"abstract\":\"The process performance for ULVAC's IW-630 200/300 mm medium current ion implanter is reviewed. The IW-630 was designed to ensure high beam parallelism, high-energy purity, and low defect contamination through the use of a ground magnet. The analyses presented include beam parallelism, energy purity, particle contamination, metals contamination, dose uniformity and repeatability.\",\"PeriodicalId\":305062,\"journal\":{\"name\":\"Ion Implantation Technology. 2002. Proceedings of the 14th International Conference on\",\"volume\":\"19 1\",\"pages\":\"0\"},\"PeriodicalIF\":0.0000,\"publicationDate\":\"1900-01-01\",\"publicationTypes\":\"Journal Article\",\"fieldsOfStudy\":null,\"isOpenAccess\":false,\"openAccessPdf\":\"\",\"citationCount\":\"0\",\"resultStr\":null,\"platform\":\"Semanticscholar\",\"paperid\":null,\"PeriodicalName\":\"Ion Implantation Technology. 2002. Proceedings of the 14th International Conference on\",\"FirstCategoryId\":\"1085\",\"ListUrlMain\":\"https://doi.org/10.1109/IIT.2002.1258048\",\"RegionNum\":0,\"RegionCategory\":null,\"ArticlePicture\":[],\"TitleCN\":null,\"AbstractTextCN\":null,\"PMCID\":null,\"EPubDate\":\"\",\"PubModel\":\"\",\"JCR\":\"\",\"JCRName\":\"\",\"Score\":null,\"Total\":0}","platform":"Semanticscholar","paperid":null,"PeriodicalName":"Ion Implantation Technology. 2002. Proceedings of the 14th International Conference on","FirstCategoryId":"1085","ListUrlMain":"https://doi.org/10.1109/IIT.2002.1258048","RegionNum":0,"RegionCategory":null,"ArticlePicture":[],"TitleCN":null,"AbstractTextCN":null,"PMCID":null,"EPubDate":"","PubModel":"","JCR":"","JCRName":"","Score":null,"Total":0}

引用次数: 0

摘要

介绍了ULVAC公司IW-630型200/300 mm中电流离子注入机的工艺性能。IW-630的设计是通过使用接地磁铁来确保高光束平行度，高能量纯度和低缺陷污染。分析包括光束平行度、能量纯度、粒子污染、金属污染、剂量均匀性和重复性。

本文章由计算机程序翻译，如有差异，请以英文原文为准。

查看原文本刊更多论文

Process performance of the ULVAC IW-630 200/300mm implanter

The process performance for ULVAC's IW-630 200/300 mm medium current ion implanter is reviewed. The IW-630 was designed to ensure high beam parallelism, high-energy purity, and low defect contamination through the use of a ground magnet. The analyses presented include beam parallelism, energy purity, particle contamination, metals contamination, dose uniformity and repeatability.

求助全文

通过发布文献求助，成功后即可免费获取论文全文。去求助

来源期刊

Ion Implantation Technology. 2002. Proceedings of the 14th International Conference on

自引率

0.00%

发文量