硅锗的扩散

A. Schuppen, M. Tortschanoff, J. Berntgen, P. Maier, D. Zerrweck, H. von der Ropp, J. Tolonics, K. Burger
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引用次数: 4

摘要

SiGe已经通过0.9-2.4 GHz范围内的rf IC渗透到III/V市场。SiGe技术具有高可靠性,也可以在低电压下运行,然而它显示了72%的PAE @ GSM频率,60%的PAE用于3W DCS功率HBT, 50%的PAE用于1.9GHz的CDMA。结合倒装芯片技术,TEMIC的SiGe1工艺非常适合高达6 GHz的射频电源系统。对于更高的频率,由于来自频率标度底部的纯Si和来自顶部的III/V器件的性能压力,下一代:SiGe2在720 GHz范围内扩散到III/V区域。SiGe2技术包括同一晶圆上的三种类型的晶体管,具有25、40和70 GHz的传输频率,对应的击穿电压为7、4和2.5V BVCE0。
本文章由计算机程序翻译,如有差异,请以英文原文为准。
The Proliferation of Silicon Germanium
SiGe has already penetrated into the III/V market by rf IC ́s in the 0.9-2.4 GHz range. SiGe technologies have a high reliability, operates also at low voltages and nevertheless it reveals 72% PAE @ GSM frequency, 60% PAE for a 3W DCS power HBT and 50% PAE for CDMA at 1.9GHz. Combined with flip chip technology TEMIC ́s SiGe1 process is well suited for rf power systems up to 6 GHz. For higher frequencies and due to performance pressure of pure Si from the bottom of the frequency scale and III/V devices from the top, the next generation: SiGe2 proliferates into III/V area in the 720 GHz range. SiGe2 technology includes three types of transistors on the same wafer, having 25, 40 and 70 GHz transit frequencies with 7, 4 and 2.5V BVCE0 corresponding breakdown voltages.
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