毫米波应用的纳米级CMOS

A. Niknejad, S. Emami, B. Heydari, M. Bohsali, E. Adabi
{"title":"毫米波应用的纳米级CMOS","authors":"A. Niknejad, S. Emami, B. Heydari, M. Bohsali, E. Adabi","doi":"10.1109/CSICS07.2007.37","DOIUrl":null,"url":null,"abstract":"Aggressive technology scaling of CMOS has culminated in a low-cost high volume commercial process technology with Ft > 150 GHz and Fmax > 200 GHz. This paper discusses the key trends in CMOS scaling that have led to this level of performance and attempts to predict the performance down to 45 nm. The design of active and passive components in CMOS for power gain and low noise are discussed in detail and unique features of CMOS technology are highlighted. Experimental results derived from a 60 GHz amplifier in 90 nm CMOS and a complete 60 GHz front-end receiver in 130 nm CMOS are reported.","PeriodicalId":370697,"journal":{"name":"2007 IEEE Compound Semiconductor Integrated Circuits Symposium","volume":"28 1","pages":"0"},"PeriodicalIF":0.0000,"publicationDate":"2007-11-19","publicationTypes":"Journal Article","fieldsOfStudy":null,"isOpenAccess":false,"openAccessPdf":"","citationCount":"23","resultStr":"{\"title\":\"Nanoscale CMOS for mm-Wave Applications\",\"authors\":\"A. Niknejad, S. Emami, B. Heydari, M. Bohsali, E. Adabi\",\"doi\":\"10.1109/CSICS07.2007.37\",\"DOIUrl\":null,\"url\":null,\"abstract\":\"Aggressive technology scaling of CMOS has culminated in a low-cost high volume commercial process technology with Ft > 150 GHz and Fmax > 200 GHz. This paper discusses the key trends in CMOS scaling that have led to this level of performance and attempts to predict the performance down to 45 nm. The design of active and passive components in CMOS for power gain and low noise are discussed in detail and unique features of CMOS technology are highlighted. Experimental results derived from a 60 GHz amplifier in 90 nm CMOS and a complete 60 GHz front-end receiver in 130 nm CMOS are reported.\",\"PeriodicalId\":370697,\"journal\":{\"name\":\"2007 IEEE Compound Semiconductor Integrated Circuits Symposium\",\"volume\":\"28 1\",\"pages\":\"0\"},\"PeriodicalIF\":0.0000,\"publicationDate\":\"2007-11-19\",\"publicationTypes\":\"Journal Article\",\"fieldsOfStudy\":null,\"isOpenAccess\":false,\"openAccessPdf\":\"\",\"citationCount\":\"23\",\"resultStr\":null,\"platform\":\"Semanticscholar\",\"paperid\":null,\"PeriodicalName\":\"2007 IEEE Compound Semiconductor Integrated Circuits Symposium\",\"FirstCategoryId\":\"1085\",\"ListUrlMain\":\"https://doi.org/10.1109/CSICS07.2007.37\",\"RegionNum\":0,\"RegionCategory\":null,\"ArticlePicture\":[],\"TitleCN\":null,\"AbstractTextCN\":null,\"PMCID\":null,\"EPubDate\":\"\",\"PubModel\":\"\",\"JCR\":\"\",\"JCRName\":\"\",\"Score\":null,\"Total\":0}","platform":"Semanticscholar","paperid":null,"PeriodicalName":"2007 IEEE Compound Semiconductor Integrated Circuits Symposium","FirstCategoryId":"1085","ListUrlMain":"https://doi.org/10.1109/CSICS07.2007.37","RegionNum":0,"RegionCategory":null,"ArticlePicture":[],"TitleCN":null,"AbstractTextCN":null,"PMCID":null,"EPubDate":"","PubModel":"","JCR":"","JCRName":"","Score":null,"Total":0}
引用次数: 23

摘要

CMOS积极的技术扩展在低成本的大批量商用工艺技术中达到顶峰,Ft >为150 GHz, Fmax >为200 GHz。本文讨论了导致这种性能水平的CMOS缩放的关键趋势,并试图预测性能降至45纳米。详细讨论了CMOS中功率增益和低噪声的有源和无源元件的设计,突出了CMOS技术的独特之处。本文报道了一个60 GHz的90 nm CMOS放大器和一个完整的130 nm CMOS 60 GHz前端接收器的实验结果。
本文章由计算机程序翻译,如有差异,请以英文原文为准。
Nanoscale CMOS for mm-Wave Applications
Aggressive technology scaling of CMOS has culminated in a low-cost high volume commercial process technology with Ft > 150 GHz and Fmax > 200 GHz. This paper discusses the key trends in CMOS scaling that have led to this level of performance and attempts to predict the performance down to 45 nm. The design of active and passive components in CMOS for power gain and low noise are discussed in detail and unique features of CMOS technology are highlighted. Experimental results derived from a 60 GHz amplifier in 90 nm CMOS and a complete 60 GHz front-end receiver in 130 nm CMOS are reported.
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