基于表面散射的EUV光学图像退化

Extreme Ultraviolet Lithography (TOPS) Pub Date : 1996-05-28 DOI:10.2172/378183

D. Gaines, T. Daly, D. Stearns, B. Lafontaine, D. Sweeney, D. Fuchs

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引用次数: 1

摘要

基于同步加速器的13纳米散射测量来自单个镜子和组装的极紫外光刻成像系统，已经与存在散射的图像形成模型进行了比较。该理论使用组成光学的功率谱密度描述来描述由于散射而对图像的修改。对于单个反射镜和组合系统，测量结果与理论结果基本一致。

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Image Degradation from Surface Scatter in EUV Optics

Synchrotron-based 13 nm measurements of scatter from individual mirrors and an assembled imaging system for Extreme Ultraviolet Lithography have been compared to a model of image formation in the presence of scatter. The theory uses a Power Spectral Density description of the constituent optics to describe modifications to the image due to scatter. Reasonable agreement between measurements and theory was obtained for both individual mirrors and the assembled system.

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Extreme Ultraviolet Lithography (TOPS)

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