人工智能在良率和故障分析中的应用,以减少总体缺陷时间和故障根源隔离

Sailesh Suthar, Lay Lay Goh
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引用次数: 0

摘要

本文介绍了人工智能在故障分析中的概念应用,以连接半导体制造中的各种数据库,并生成交互式数据可视化,以比传统方法更快地隔离故障的根本原因。利用微软Power BI (Business Intelligence)等普遍可用的低成本软件应用程序对大数据进行可视化,以隔离晶圆、晶片和封装级别的故障模式。故障分析人员进一步使用这种历史数据可视化知识,以更快地处理基于故障包单元历史的故障模式隔离。半导体制造公司拥有各种大数据,如晶圆厂加工,芯片水平测试,或晶圆分类和封装芯片测试,包括客户退货。MS Power BI应用程序能够连接到这些独立的大型数据库,并创建统一的数据可视化,通过更快的互连和“连接点”来隔离故障模式,以提供更大的图片或深入到更精细的单元级细节。这个级别的可视化利用已经可用的信息/数据来帮助减少总体的缺陷产生时间。有了这种故障背景,工程师就可以计划故障隔离和分析,减少查找故障根本原因的总时间。
本文章由计算机程序翻译,如有差异,请以英文原文为准。
AI Application in Yield and Failure Analysis to Reduce Overall Time-to-Defect and Failure Root-Cause Isolation
This paper presents conceptual application of AI in Failure Analysis to connect to various databases in semiconductor manufacturing and generating interactive data visualization to isolate root cause of failure faster vs traditional methods. Generally available low-cost software application like Microsoft Power BI (Business Intelligence) is utilized to visualize big data to isolate failure modes at wafer, die, and package level. This historic data visualization knowledge is further used by failure analyst to process failure mode isolation much faster based on failed package unit history. Semiconductor manufacturing companies have various big data such as wafer fab processing, die level test, or wafer sort and packaged die testing including customer return. MS Power BI application has ability to connect to these separate big databases and create unified data visualization to isolate failure modes through faster inter-connectivity and "connecting the dots" to provide bigger picture or drill down to finer unit level detail. This level of visualization utilizes already available info/data to help reduce overall time-to-defect. With this failure background, engineers can plan fault isolation and analysis and reduce overall time to find root-cause of failure.
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