GaN半桥交叉传导的诊断

Ya-jie Qiu, Jinseng Vanderkloot, Ruoyu Hou, Juncheng Lu
{"title":"GaN半桥交叉传导的诊断","authors":"Ya-jie Qiu, Jinseng Vanderkloot, Ruoyu Hou, Juncheng Lu","doi":"10.1109/APEC39645.2020.9124086","DOIUrl":null,"url":null,"abstract":"GaN E-HEMTs eliminate the inherent parasitic diodes compared to Si MOSFETs and have faster switching speeds and slew rates [1]. These and other improved characteristics of GaN E-HEMTs have reduced system size and weight, have delivered lower system costs and have increased efficiency [2]. However, advancements in the GaN HEMTs used in switching power supplies have made characterizing the performance of these power supplies increasingly challenging. A particularly demanding measurement is measuring the high-side VGS in a half bridge, which is a traditional way to diagnose the cross-conduction for Si MOSFETs. Although special probes and measurement systems with galvanic isolation (optical isolation) have been developed for this purpose, GaN users are discouraged by the cost and are seeking a lower cost method to diagnose GaN cross-conduction. By taking advantage of GaN’s unique feature (no body diode and reverse recovery loss), this paper is proposing a practical way to diagnose the cross-conduction /potential cross-conduction without sensing the high-side VGS: i. Calculating the high-side Coss charge during the voltage commutation; ii. Implementing a set of double pulse tests and recording the low-side drain currents; iii. Integrating the low-side drain current bump area above the load current and iv. Confirming that the result should match the COSS charge value. The proposed diagnostic method has been demonstrated by using the 25 mΩ RDS_on 650V GaN HEMT GS66516T as an example.","PeriodicalId":171455,"journal":{"name":"2020 IEEE Applied Power Electronics Conference and Exposition (APEC)","volume":"51 1","pages":"0"},"PeriodicalIF":0.0000,"publicationDate":"2020-03-01","publicationTypes":"Journal Article","fieldsOfStudy":null,"isOpenAccess":false,"openAccessPdf":"","citationCount":"1","resultStr":"{\"title\":\"Diagnosing for Cross-conduction in GaN Half-Bridge\",\"authors\":\"Ya-jie Qiu, Jinseng Vanderkloot, Ruoyu Hou, Juncheng Lu\",\"doi\":\"10.1109/APEC39645.2020.9124086\",\"DOIUrl\":null,\"url\":null,\"abstract\":\"GaN E-HEMTs eliminate the inherent parasitic diodes compared to Si MOSFETs and have faster switching speeds and slew rates [1]. These and other improved characteristics of GaN E-HEMTs have reduced system size and weight, have delivered lower system costs and have increased efficiency [2]. However, advancements in the GaN HEMTs used in switching power supplies have made characterizing the performance of these power supplies increasingly challenging. A particularly demanding measurement is measuring the high-side VGS in a half bridge, which is a traditional way to diagnose the cross-conduction for Si MOSFETs. Although special probes and measurement systems with galvanic isolation (optical isolation) have been developed for this purpose, GaN users are discouraged by the cost and are seeking a lower cost method to diagnose GaN cross-conduction. By taking advantage of GaN’s unique feature (no body diode and reverse recovery loss), this paper is proposing a practical way to diagnose the cross-conduction /potential cross-conduction without sensing the high-side VGS: i. Calculating the high-side Coss charge during the voltage commutation; ii. Implementing a set of double pulse tests and recording the low-side drain currents; iii. Integrating the low-side drain current bump area above the load current and iv. Confirming that the result should match the COSS charge value. The proposed diagnostic method has been demonstrated by using the 25 mΩ RDS_on 650V GaN HEMT GS66516T as an example.\",\"PeriodicalId\":171455,\"journal\":{\"name\":\"2020 IEEE Applied Power Electronics Conference and Exposition (APEC)\",\"volume\":\"51 1\",\"pages\":\"0\"},\"PeriodicalIF\":0.0000,\"publicationDate\":\"2020-03-01\",\"publicationTypes\":\"Journal Article\",\"fieldsOfStudy\":null,\"isOpenAccess\":false,\"openAccessPdf\":\"\",\"citationCount\":\"1\",\"resultStr\":null,\"platform\":\"Semanticscholar\",\"paperid\":null,\"PeriodicalName\":\"2020 IEEE Applied Power Electronics Conference and Exposition (APEC)\",\"FirstCategoryId\":\"1085\",\"ListUrlMain\":\"https://doi.org/10.1109/APEC39645.2020.9124086\",\"RegionNum\":0,\"RegionCategory\":null,\"ArticlePicture\":[],\"TitleCN\":null,\"AbstractTextCN\":null,\"PMCID\":null,\"EPubDate\":\"\",\"PubModel\":\"\",\"JCR\":\"\",\"JCRName\":\"\",\"Score\":null,\"Total\":0}","platform":"Semanticscholar","paperid":null,"PeriodicalName":"2020 IEEE Applied Power Electronics Conference and Exposition (APEC)","FirstCategoryId":"1085","ListUrlMain":"https://doi.org/10.1109/APEC39645.2020.9124086","RegionNum":0,"RegionCategory":null,"ArticlePicture":[],"TitleCN":null,"AbstractTextCN":null,"PMCID":null,"EPubDate":"","PubModel":"","JCR":"","JCRName":"","Score":null,"Total":0}
引用次数: 1

摘要

与Si mosfet相比,GaN e - hemt消除了固有的寄生二极管,并且具有更快的开关速度和转换速率。GaN e - hemt的这些和其他改进特性减小了系统尺寸和重量,降低了系统成本,提高了效率。然而,用于开关电源的GaN hemt的进步使得表征这些电源的性能越来越具有挑战性。一种要求特别高的测量方法是在半桥中测量高侧VGS,这是诊断Si mosfet交叉导通的传统方法。尽管为此目的已经开发了具有电流隔离(光隔离)的特殊探头和测量系统,但GaN用户对成本感到沮丧,并正在寻求一种更低成本的方法来诊断GaN交叉传导。利用GaN的独特特性(无体二极管和反向恢复损耗),本文提出了一种无需检测高侧VGS即可诊断交叉导通/电位交叉导通的实用方法:1 .计算电压换相时的高侧损耗电荷;2实施一套双脉冲测试并记录低侧漏极电流;3将负载电流和iv以上的低侧漏极电流碰撞区域积分,确认结果应与COSS电荷值匹配。以25 mΩ RDS_on 650V GaN HEMT GS66516T为例进行了验证。
本文章由计算机程序翻译,如有差异,请以英文原文为准。
Diagnosing for Cross-conduction in GaN Half-Bridge
GaN E-HEMTs eliminate the inherent parasitic diodes compared to Si MOSFETs and have faster switching speeds and slew rates [1]. These and other improved characteristics of GaN E-HEMTs have reduced system size and weight, have delivered lower system costs and have increased efficiency [2]. However, advancements in the GaN HEMTs used in switching power supplies have made characterizing the performance of these power supplies increasingly challenging. A particularly demanding measurement is measuring the high-side VGS in a half bridge, which is a traditional way to diagnose the cross-conduction for Si MOSFETs. Although special probes and measurement systems with galvanic isolation (optical isolation) have been developed for this purpose, GaN users are discouraged by the cost and are seeking a lower cost method to diagnose GaN cross-conduction. By taking advantage of GaN’s unique feature (no body diode and reverse recovery loss), this paper is proposing a practical way to diagnose the cross-conduction /potential cross-conduction without sensing the high-side VGS: i. Calculating the high-side Coss charge during the voltage commutation; ii. Implementing a set of double pulse tests and recording the low-side drain currents; iii. Integrating the low-side drain current bump area above the load current and iv. Confirming that the result should match the COSS charge value. The proposed diagnostic method has been demonstrated by using the 25 mΩ RDS_on 650V GaN HEMT GS66516T as an example.
求助全文
通过发布文献求助,成功后即可免费获取论文全文。 去求助
来源期刊
自引率
0.00%
发文量
0
×
引用
GB/T 7714-2015
复制
MLA
复制
APA
复制
导出至
BibTeX EndNote RefMan NoteFirst NoteExpress
×
提示
您的信息不完整,为了账户安全,请先补充。
现在去补充
×
提示
您因"违规操作"
具体请查看互助需知
我知道了
×
提示
确定
请完成安全验证×
copy
已复制链接
快去分享给好友吧!
我知道了
右上角分享
点击右上角分享
0
联系我们:info@booksci.cn Book学术提供免费学术资源搜索服务,方便国内外学者检索中英文文献。致力于提供最便捷和优质的服务体验。 Copyright © 2023 布克学术 All rights reserved.
京ICP备2023020795号-1
ghs 京公网安备 11010802042870号
Book学术文献互助
Book学术文献互助群
群 号:481959085
Book学术官方微信