极紫外光下航空图像直接测量的初步实验

Extreme Ultraviolet Lithography (TOPS) Pub Date : 1900-01-01 DOI:10.1364/eul.1996.om124

C. H. Fields, W. Oldham, A. Ray-Chaudhuri, K. Krenz, R. Stulen

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引用次数: 2

摘要

本文报道了应用直接航空图像监测技术(AIM)测量极紫外光刻(EUVL)试验台性能的研究现状。有几个问题可能会限制在EUVL系统上进行图像监控实验的可能性。这些问题包括:源通量，信噪比和EUV扫描孔径制造。

本文章由计算机程序翻译，如有差异，请以英文原文为准。

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Initial Experiments on Direct Aerial Image Measurements in the Extreme Ultraviolet

We report the current status of research to apply the technique of direct aerial image monitoring (AIM) to measure the performance of an Extreme Ultraviolet Lithography (EUVL) test bed. There are several issues which might limit the possibility of performing image monitoring experiments on EUVL systems. These issues include: Source flux, signal to noise ratios, and EUV scanning aperture fabrication.

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Extreme Ultraviolet Lithography (TOPS)

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