{"title":"用于纳米光子学的可伸缩高各向异性反应离子蚀刻硅","authors":"Eih-Zhe Liang, Ching-Fuh Lin","doi":"10.1109/CLEOE.2005.1568381","DOIUrl":null,"url":null,"abstract":"In this work, we demonstrate both scalability down to decanometer and high anisotropy up to 90% in fabrication of Si nanostructure by reactive ion etching. Silicon nanorods with 20 nm diameter size are fabricated on single-crystalline silicon surface","PeriodicalId":354643,"journal":{"name":"CLEO/Europe. 2005 Conference on Lasers and Electro-Optics Europe, 2005.","volume":"31 1","pages":"0"},"PeriodicalIF":0.0000,"publicationDate":"2005-06-17","publicationTypes":"Journal Article","fieldsOfStudy":null,"isOpenAccess":false,"openAccessPdf":"","citationCount":"0","resultStr":"{\"title\":\"Scalable highly-anisotropic reactive ion etch on Si for nanophotonics\",\"authors\":\"Eih-Zhe Liang, Ching-Fuh Lin\",\"doi\":\"10.1109/CLEOE.2005.1568381\",\"DOIUrl\":null,\"url\":null,\"abstract\":\"In this work, we demonstrate both scalability down to decanometer and high anisotropy up to 90% in fabrication of Si nanostructure by reactive ion etching. Silicon nanorods with 20 nm diameter size are fabricated on single-crystalline silicon surface\",\"PeriodicalId\":354643,\"journal\":{\"name\":\"CLEO/Europe. 2005 Conference on Lasers and Electro-Optics Europe, 2005.\",\"volume\":\"31 1\",\"pages\":\"0\"},\"PeriodicalIF\":0.0000,\"publicationDate\":\"2005-06-17\",\"publicationTypes\":\"Journal Article\",\"fieldsOfStudy\":null,\"isOpenAccess\":false,\"openAccessPdf\":\"\",\"citationCount\":\"0\",\"resultStr\":null,\"platform\":\"Semanticscholar\",\"paperid\":null,\"PeriodicalName\":\"CLEO/Europe. 2005 Conference on Lasers and Electro-Optics Europe, 2005.\",\"FirstCategoryId\":\"1085\",\"ListUrlMain\":\"https://doi.org/10.1109/CLEOE.2005.1568381\",\"RegionNum\":0,\"RegionCategory\":null,\"ArticlePicture\":[],\"TitleCN\":null,\"AbstractTextCN\":null,\"PMCID\":null,\"EPubDate\":\"\",\"PubModel\":\"\",\"JCR\":\"\",\"JCRName\":\"\",\"Score\":null,\"Total\":0}","platform":"Semanticscholar","paperid":null,"PeriodicalName":"CLEO/Europe. 2005 Conference on Lasers and Electro-Optics Europe, 2005.","FirstCategoryId":"1085","ListUrlMain":"https://doi.org/10.1109/CLEOE.2005.1568381","RegionNum":0,"RegionCategory":null,"ArticlePicture":[],"TitleCN":null,"AbstractTextCN":null,"PMCID":null,"EPubDate":"","PubModel":"","JCR":"","JCRName":"","Score":null,"Total":0}
Scalable highly-anisotropic reactive ion etch on Si for nanophotonics
In this work, we demonstrate both scalability down to decanometer and high anisotropy up to 90% in fabrication of Si nanostructure by reactive ion etching. Silicon nanorods with 20 nm diameter size are fabricated on single-crystalline silicon surface
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