Xin Wang, D. Kencke, K.C. Liu, A. Tasch, L. Register, S. Banerjee
{"title":"用蒙特卡罗方法研究了新型正交应变硅材料中的电子输运性质","authors":"Xin Wang, D. Kencke, K.C. Liu, A. Tasch, L. Register, S. Banerjee","doi":"10.1109/SISPAD.2000.871209","DOIUrl":null,"url":null,"abstract":"We report for the first time on the electron transport properties of simple orthorhombically-strained silicon studied by density-functional theory and Monte Carlo simulation. The six degenerate valleys near X points in bulk silicon break into three pairs with different energy minima due to the orthorhombic strain. The degeneracy lifting causes electron redistribution among these valleys at low and intermediate electric fields. Thus the drift velocity is enhanced under an electric field transverse to the long-axis of the lowest valleys. The simple orthorhombically-strained Si grown on a Si-Si/sub 0.6/Ge/sub 0.4/ sidewall has a low-field mobility almost twice that of bulk Si and an electron saturation velocity approximately 20% higher.","PeriodicalId":132609,"journal":{"name":"2000 International Conference on Simulation Semiconductor Processes and Devices (Cat. No.00TH8502)","volume":"313 1","pages":"0"},"PeriodicalIF":0.0000,"publicationDate":"1900-01-01","publicationTypes":"Journal Article","fieldsOfStudy":null,"isOpenAccess":false,"openAccessPdf":"","citationCount":"6","resultStr":"{\"title\":\"Electron transport properties in novel orthorhombically-strained silicon material explored by the Monte Carlo method\",\"authors\":\"Xin Wang, D. Kencke, K.C. Liu, A. Tasch, L. Register, S. Banerjee\",\"doi\":\"10.1109/SISPAD.2000.871209\",\"DOIUrl\":null,\"url\":null,\"abstract\":\"We report for the first time on the electron transport properties of simple orthorhombically-strained silicon studied by density-functional theory and Monte Carlo simulation. The six degenerate valleys near X points in bulk silicon break into three pairs with different energy minima due to the orthorhombic strain. The degeneracy lifting causes electron redistribution among these valleys at low and intermediate electric fields. Thus the drift velocity is enhanced under an electric field transverse to the long-axis of the lowest valleys. The simple orthorhombically-strained Si grown on a Si-Si/sub 0.6/Ge/sub 0.4/ sidewall has a low-field mobility almost twice that of bulk Si and an electron saturation velocity approximately 20% higher.\",\"PeriodicalId\":132609,\"journal\":{\"name\":\"2000 International Conference on Simulation Semiconductor Processes and Devices (Cat. No.00TH8502)\",\"volume\":\"313 1\",\"pages\":\"0\"},\"PeriodicalIF\":0.0000,\"publicationDate\":\"1900-01-01\",\"publicationTypes\":\"Journal Article\",\"fieldsOfStudy\":null,\"isOpenAccess\":false,\"openAccessPdf\":\"\",\"citationCount\":\"6\",\"resultStr\":null,\"platform\":\"Semanticscholar\",\"paperid\":null,\"PeriodicalName\":\"2000 International Conference on Simulation Semiconductor Processes and Devices (Cat. No.00TH8502)\",\"FirstCategoryId\":\"1085\",\"ListUrlMain\":\"https://doi.org/10.1109/SISPAD.2000.871209\",\"RegionNum\":0,\"RegionCategory\":null,\"ArticlePicture\":[],\"TitleCN\":null,\"AbstractTextCN\":null,\"PMCID\":null,\"EPubDate\":\"\",\"PubModel\":\"\",\"JCR\":\"\",\"JCRName\":\"\",\"Score\":null,\"Total\":0}","platform":"Semanticscholar","paperid":null,"PeriodicalName":"2000 International Conference on Simulation Semiconductor Processes and Devices (Cat. No.00TH8502)","FirstCategoryId":"1085","ListUrlMain":"https://doi.org/10.1109/SISPAD.2000.871209","RegionNum":0,"RegionCategory":null,"ArticlePicture":[],"TitleCN":null,"AbstractTextCN":null,"PMCID":null,"EPubDate":"","PubModel":"","JCR":"","JCRName":"","Score":null,"Total":0}
Electron transport properties in novel orthorhombically-strained silicon material explored by the Monte Carlo method
We report for the first time on the electron transport properties of simple orthorhombically-strained silicon studied by density-functional theory and Monte Carlo simulation. The six degenerate valleys near X points in bulk silicon break into three pairs with different energy minima due to the orthorhombic strain. The degeneracy lifting causes electron redistribution among these valleys at low and intermediate electric fields. Thus the drift velocity is enhanced under an electric field transverse to the long-axis of the lowest valleys. The simple orthorhombically-strained Si grown on a Si-Si/sub 0.6/Ge/sub 0.4/ sidewall has a low-field mobility almost twice that of bulk Si and an electron saturation velocity approximately 20% higher.