双栅隧道场效应管超阈区漏极电流解析模型

Joy Chowdhury, A. Sarkar, K. Mahapatra, J. Das
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引用次数: 0

摘要

为了支持电子系统市场的小型化和低功耗需求,由于短通道效应的性能下降,基本的标度定律被破坏。最近开发的tfet采用带间隧道(tbbt)作为电流注入机制,与传统的SOI mosfet相比,具有更好的亚阈值摆幅(低于60mV/dec)。本文提出了超阈值区域漏极电流的解析模型。采用抛物线势法,考虑了边缘场和通道内移动电荷的影响。该模型预测表面电位、电场和BTBT电流具有合理的精度,从而反映了大部分物理器件现象。
本文章由计算机程序翻译,如有差异,请以英文原文为准。
Analytical Drain Current Model for Super-Threshold Region of Double Gate Tunnel FET
To support miniaturization and low power demands of the electronic systems market, the essential scaling laws are marred due to performance degradation by Short Channel Effects. The recently developed TFETs follow interband tunneling (BTBT) as their current injection mechanism and have better subthreshold swing (below 60mV/dec) compared to the conventional SOI MOSFETs. This article presents an analytical model for drain current in the super threshold region. The parabolic potential approach is used including the effect of fringing fields and mobile charges in the channel. This model predicts the surface potential, electric field and BTBT current with reasonable accuracy, thus reflecting most of the physical device phenomena.
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