碳纳米管阴极的KrF激光表面处理

T. Honda, W. Rochanachirapar, K. Murakami, K. Ohsumi, N. Shimizu, S. Abo, F. Wakaya, M. Takai
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引用次数: 0

摘要

用不同功率密度、均匀光斑光束的KrF激光照射不同浆料制备的碳纳米管阴极。均匀光斑光束的导通场最小。在浆料中加入玻璃填料,使浆料的性能得到很大改善。在2 V//spl mu/m场下,KrF激光的导通场低至0.34 V//spl mu/m,发射密度高达5.88 mA/cm/sup 2/。采用均匀激光束照射可获得均匀的发射场分布。
本文章由计算机程序翻译,如有差异,请以英文原文为准。
KrF laser surface treatment of CNT cathodes
Carbon nanotube (CNT) cathodes prepared with various pastes are irradiated by KrF laser light with different power densities and homogenous spot beam. The turn-on field is lowest with the homogeneous spot beam. The characteristics are improved greatly by adding glass fillers to the paste. The turn-on field is as low as 0.34 V//spl mu/m and the emission density is as high as 5.88 mA/cm/sup 2/ at a field of 2 V//spl mu/m by KrF laser irradiation. Homogeneous emission-site distribution could be obtained by a homogeneous laser beam irradiation.
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