考虑温度和ITC变化的Si/Ge异质结非对称双栅DLTFET性能研究

Suruchi Sharma, R. Basu, B. Kaur
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引用次数: 0

摘要

本文研究了HJ-ADG-DLTFET的性能,考虑温度在200 K-500 K之间的变化,并利用Silvaco ATLAS研究了负极(NITC)和正极(PITC)的界面陷阱电荷(ITC)密度的变化。这是通过评估模拟/RF性能参数来完成的,如跨导$(\ mathm {g}_{\ mathm {m}})$、截止频率$(\ mathm {f}_{\ mathm {T}})$和器件效率(DE)。此外,温度在200-500 K范围内的变化表明了HJ-ADGDLTFET的失态电流的退化。此外,DE在低温下也会增强。
本文章由计算机程序翻译,如有差异,请以英文原文为准。
Performance Investigation of a Si/Ge Heterojunction Asymmetric Double Gate DLTFET Considering Temperature and ITC Variations
This manuscript investigates the performance of HJ-ADG-DLTFET considering temperature variations from 200 K-500 K and by varying Interface Trap Charges (ITC) density of negative (NITC) as well as positive polarity (PITC) by utilizing Silvaco ATLAS. This is done by evaluating analog/RF performance parameters such as transconductance $(\mathrm{g}_{\mathrm{m}})$, cut-off frequency $(\mathrm{f}_{\mathrm{T}})$ and Device efficiency (DE). Furthermore, temperature variations for the range from 200-500 K demonstrate the degradation of the off-state current of HJ-ADGDLTFET. Also, DE enhances at low temperatures.
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