垂直隧穿路径的InAs-Si异质结双栅隧道场效应管分析

H. Carrillo-Nuñez, M. Luisier, A. Schenk
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引用次数: 3

摘要

研究了利用二维(2D)态密度(DOS)开关的铟硅双栅tfet。采用基于sp3d5s*紧密结合模型的全波段原子量子输运模拟器解决了横向和纵向带间隧道路径下的量子输运问题。也研究了只有垂直隧穿元件的tfet。我们的研究结果表明,InAs-Si 2D-2D tfet可能提供一种具有陡峭亚热亚阈值摆幅(SS)和高导通电流的器件解决方案。在极薄的InAs-Si 2D-2D TFET的最佳情况下,最小摆幅达到SS = 12mV/dec,导通电流达到241 A/m。
本文章由计算机程序翻译,如有差异,请以英文原文为准。
Analysis of InAs-Si heterojunction double-gate tunnel FETs with vertical tunneling paths
InAs-Si double-gate TFETs exploiting the two-dimensional (2D) density-of-state (DOS) switch are studied. A full-band and atomistic quantum transport simulator based on the sp3d5s* tight-binding model is used to solve the quantum transport problem taking into account both lateral and vertical band-to-band tunneling paths. TFETs with only vertical tunneling components are also investigated. Our findings suggest that InAs-Si 2D-2D TFETs might offer a device solution with both steep sub-thermal sub-threshold swing (SS) and high ON-current. In the best case of an extremely thin InAs-Si 2D-2D TFET the minimal swing reaches SS = 12mV/dec and the ON-current 241 A/m.
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