采用65nm深度耗尽通道晶体管制造的传感器网络处理器的峰值功耗降低

K. Kawakami, T. Shiro, Hironobu Yamasaki, K. Yoda, Hiroaki Fujimoto, K. Kawasaki, Yasuhiro Watanabe
{"title":"采用65nm深度耗尽通道晶体管制造的传感器网络处理器的峰值功耗降低","authors":"K. Kawakami, T. Shiro, Hironobu Yamasaki, K. Yoda, Hiroaki Fujimoto, K. Kawasaki, Yasuhiro Watanabe","doi":"10.1109/ISQED.2013.6523646","DOIUrl":null,"url":null,"abstract":"We fabricated a low power sensor network processor with Deeply Depleted Channel (DDC) transistors of 65 nm technology, which has distinguishing device structure and enables variation of threshold voltage (Vth) of transistors to decrease. At the optimal voltage condition to achieve the same maximum operating frequency, measurement result shows that the DDC process achieves a 47.0 % of peak power reduction for the micro controller unit (MCU) compared to the conventional low power (LP) process. Measurement result also shows the DDC process improves 56.5 % and 15.0 % of operating frequency, 200 mV and 50 mV of supply voltage margin, or 23.8 % and 19.0 % of power reduction for the MCU and 320 KB SRAM, respectively, even if the Vth of the LP process is adjusted to that of the DDC process. The paper has also discussed the optimal voltage control method, which is suitable for the various applications of sensor network processors.","PeriodicalId":127115,"journal":{"name":"International Symposium on Quality Electronic Design (ISQED)","volume":null,"pages":null},"PeriodicalIF":0.0000,"publicationDate":"2013-03-04","publicationTypes":"Journal Article","fieldsOfStudy":null,"isOpenAccess":false,"openAccessPdf":"","citationCount":"0","resultStr":"{\"title\":\"Peak power reduction of a sensor network processor fabricated with Deeply Depleted Channel transistors in 65nm technology\",\"authors\":\"K. Kawakami, T. Shiro, Hironobu Yamasaki, K. Yoda, Hiroaki Fujimoto, K. Kawasaki, Yasuhiro Watanabe\",\"doi\":\"10.1109/ISQED.2013.6523646\",\"DOIUrl\":null,\"url\":null,\"abstract\":\"We fabricated a low power sensor network processor with Deeply Depleted Channel (DDC) transistors of 65 nm technology, which has distinguishing device structure and enables variation of threshold voltage (Vth) of transistors to decrease. At the optimal voltage condition to achieve the same maximum operating frequency, measurement result shows that the DDC process achieves a 47.0 % of peak power reduction for the micro controller unit (MCU) compared to the conventional low power (LP) process. Measurement result also shows the DDC process improves 56.5 % and 15.0 % of operating frequency, 200 mV and 50 mV of supply voltage margin, or 23.8 % and 19.0 % of power reduction for the MCU and 320 KB SRAM, respectively, even if the Vth of the LP process is adjusted to that of the DDC process. The paper has also discussed the optimal voltage control method, which is suitable for the various applications of sensor network processors.\",\"PeriodicalId\":127115,\"journal\":{\"name\":\"International Symposium on Quality Electronic Design (ISQED)\",\"volume\":null,\"pages\":null},\"PeriodicalIF\":0.0000,\"publicationDate\":\"2013-03-04\",\"publicationTypes\":\"Journal Article\",\"fieldsOfStudy\":null,\"isOpenAccess\":false,\"openAccessPdf\":\"\",\"citationCount\":\"0\",\"resultStr\":null,\"platform\":\"Semanticscholar\",\"paperid\":null,\"PeriodicalName\":\"International Symposium on Quality Electronic Design (ISQED)\",\"FirstCategoryId\":\"1085\",\"ListUrlMain\":\"https://doi.org/10.1109/ISQED.2013.6523646\",\"RegionNum\":0,\"RegionCategory\":null,\"ArticlePicture\":[],\"TitleCN\":null,\"AbstractTextCN\":null,\"PMCID\":null,\"EPubDate\":\"\",\"PubModel\":\"\",\"JCR\":\"\",\"JCRName\":\"\",\"Score\":null,\"Total\":0}","platform":"Semanticscholar","paperid":null,"PeriodicalName":"International Symposium on Quality Electronic Design (ISQED)","FirstCategoryId":"1085","ListUrlMain":"https://doi.org/10.1109/ISQED.2013.6523646","RegionNum":0,"RegionCategory":null,"ArticlePicture":[],"TitleCN":null,"AbstractTextCN":null,"PMCID":null,"EPubDate":"","PubModel":"","JCR":"","JCRName":"","Score":null,"Total":0}
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摘要

采用65纳米深度耗尽通道(deep depletion Channel, DDC)晶体管制作了一种低功耗传感器网络处理器,该处理器具有独特的器件结构,可以减小晶体管阈值电压(Vth)的变化。在获得相同最大工作频率的最佳电压条件下,测量结果表明,与传统的低功耗(LP)工艺相比,DDC工艺使微控制器单元(MCU)的峰值功耗降低了47.0%。测量结果也显示了DDC流程提高工作频率的56.5%和15.0%,200 mV和50 mV的电源电压,或23.8%和19.0%的功率降低单片机和320 KB的SRAM,分别,即使Vth LP过程的调整,DDC的过程。本文还讨论了适用于传感器网络处理器各种应用的最优电压控制方法。
本文章由计算机程序翻译,如有差异,请以英文原文为准。
Peak power reduction of a sensor network processor fabricated with Deeply Depleted Channel transistors in 65nm technology
We fabricated a low power sensor network processor with Deeply Depleted Channel (DDC) transistors of 65 nm technology, which has distinguishing device structure and enables variation of threshold voltage (Vth) of transistors to decrease. At the optimal voltage condition to achieve the same maximum operating frequency, measurement result shows that the DDC process achieves a 47.0 % of peak power reduction for the micro controller unit (MCU) compared to the conventional low power (LP) process. Measurement result also shows the DDC process improves 56.5 % and 15.0 % of operating frequency, 200 mV and 50 mV of supply voltage margin, or 23.8 % and 19.0 % of power reduction for the MCU and 320 KB SRAM, respectively, even if the Vth of the LP process is adjusted to that of the DDC process. The paper has also discussed the optimal voltage control method, which is suitable for the various applications of sensor network processors.
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