真空微电子元件的单掩模制造工艺及初步表征结果

A. Phommahaxay, G. Lissorgues, T. Bourouina, P. Nicole
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摘要

在使用单一掩模制造工艺时,我们的工作使真空微组件的快速原型制作成为可能。第一批原型,包括横向二极管和三极管,已经用低成本的铝工艺生产出来,包括一个金属层,一个光刻步骤和硅微加工。将评估工艺优化对特性的影响。未来将研究采用更合适的场极材料(如钨)的不同结构。
本文章由计算机程序翻译,如有差异,请以英文原文为准。
Single mask fabrication process of vacuum microelectronics components and preliminary characterization results
In using a single mask fabrication process, our work enables the rapid prototyping of vacuum micro-components. The first prototypes, including lateral diodes and triodes, have been produced with a low-cost aluminum process, consisting of one metal layer, one lithography step and silicon micromachining. The effects of the process optimization on the characteristics will be assessed. Different configurations using more suitable field emitter materials such as tungsten will be studied in the future.
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