{"title":"为整个离子注入模块的生命安全系统的应用提供了一种有效的方案","authors":"N. Rivera, M. Sherrett, J. Mayer","doi":"10.1109/IIT.2002.1258047","DOIUrl":null,"url":null,"abstract":"An ion implantation fab module uses some of the most toxic materials within a given fab site. The paper discusses an optimum approach to cover an entire module as well as the details of using the proper monitoring technology to confidently detect gas materials such as arsine, phosphine, boron trifluoride, silicon tetrafluoride and germanium tetrafluoride. Feedback from user sites will be cited as to the success of this application.","PeriodicalId":305062,"journal":{"name":"Ion Implantation Technology. 2002. Proceedings of the 14th International Conference on","volume":"36 1","pages":"0"},"PeriodicalIF":0.0000,"publicationDate":"1900-01-01","publicationTypes":"Journal Article","fieldsOfStudy":null,"isOpenAccess":false,"openAccessPdf":"","citationCount":"0","resultStr":"{\"title\":\"An effective scheme for the application of a life safety system for the entire ion implant module\",\"authors\":\"N. Rivera, M. Sherrett, J. Mayer\",\"doi\":\"10.1109/IIT.2002.1258047\",\"DOIUrl\":null,\"url\":null,\"abstract\":\"An ion implantation fab module uses some of the most toxic materials within a given fab site. The paper discusses an optimum approach to cover an entire module as well as the details of using the proper monitoring technology to confidently detect gas materials such as arsine, phosphine, boron trifluoride, silicon tetrafluoride and germanium tetrafluoride. Feedback from user sites will be cited as to the success of this application.\",\"PeriodicalId\":305062,\"journal\":{\"name\":\"Ion Implantation Technology. 2002. Proceedings of the 14th International Conference on\",\"volume\":\"36 1\",\"pages\":\"0\"},\"PeriodicalIF\":0.0000,\"publicationDate\":\"1900-01-01\",\"publicationTypes\":\"Journal Article\",\"fieldsOfStudy\":null,\"isOpenAccess\":false,\"openAccessPdf\":\"\",\"citationCount\":\"0\",\"resultStr\":null,\"platform\":\"Semanticscholar\",\"paperid\":null,\"PeriodicalName\":\"Ion Implantation Technology. 2002. Proceedings of the 14th International Conference on\",\"FirstCategoryId\":\"1085\",\"ListUrlMain\":\"https://doi.org/10.1109/IIT.2002.1258047\",\"RegionNum\":0,\"RegionCategory\":null,\"ArticlePicture\":[],\"TitleCN\":null,\"AbstractTextCN\":null,\"PMCID\":null,\"EPubDate\":\"\",\"PubModel\":\"\",\"JCR\":\"\",\"JCRName\":\"\",\"Score\":null,\"Total\":0}","platform":"Semanticscholar","paperid":null,"PeriodicalName":"Ion Implantation Technology. 2002. Proceedings of the 14th International Conference on","FirstCategoryId":"1085","ListUrlMain":"https://doi.org/10.1109/IIT.2002.1258047","RegionNum":0,"RegionCategory":null,"ArticlePicture":[],"TitleCN":null,"AbstractTextCN":null,"PMCID":null,"EPubDate":"","PubModel":"","JCR":"","JCRName":"","Score":null,"Total":0}
An effective scheme for the application of a life safety system for the entire ion implant module
An ion implantation fab module uses some of the most toxic materials within a given fab site. The paper discusses an optimum approach to cover an entire module as well as the details of using the proper monitoring technology to confidently detect gas materials such as arsine, phosphine, boron trifluoride, silicon tetrafluoride and germanium tetrafluoride. Feedback from user sites will be cited as to the success of this application.