{"title":"串行光刻簇的性能评估:排队模型，吞吐量和工作负载排序","authors":"J. R. Morrison, B. Bortnick, D.P. Martin","doi":"10.1109/ASMC.2006.1638722","DOIUrl":null,"url":null,"abstract":"For clustered configuration of a photolithography toolset, operating under a scheduling policy inducing serial processing, measures of system performance are deduced. Queueing models demonstrate that, due to the parallelism inherent in the system configuration, the normalized cycle time behavior is different than that of the standard single server queue. Cluster throughput is evaluated based on measures of the frequency and magnitude of events common in manufacturing operation. It is shown that the maximum throughput of a serial photolithography cluster tool is not influenced by the order in which two classes of lots with different wafer processing speeds are processed","PeriodicalId":407645,"journal":{"name":"The 17th Annual SEMI/IEEE ASMC 2006 Conference","volume":"27 1","pages":"0"},"PeriodicalIF":0.0000,"publicationDate":"2006-05-22","publicationTypes":"Journal Article","fieldsOfStudy":null,"isOpenAccess":false,"openAccessPdf":"","citationCount":"5","resultStr":"{\"title\":\"Performance Evaluation of Serial Photolithography Clusters: Queueing Models, Throughput and Workload Sequencing\",\"authors\":\"J. R. Morrison, B. Bortnick, D.P. Martin\",\"doi\":\"10.1109/ASMC.2006.1638722\",\"DOIUrl\":null,\"url\":null,\"abstract\":\"For clustered configuration of a photolithography toolset, operating under a scheduling policy inducing serial processing, measures of system performance are deduced. Queueing models demonstrate that, due to the parallelism inherent in the system configuration, the normalized cycle time behavior is different than that of the standard single server queue. Cluster throughput is evaluated based on measures of the frequency and magnitude of events common in manufacturing operation. It is shown that the maximum throughput of a serial photolithography cluster tool is not influenced by the order in which two classes of lots with different wafer processing speeds are processed\",\"PeriodicalId\":407645,\"journal\":{\"name\":\"The 17th Annual SEMI/IEEE ASMC 2006 Conference\",\"volume\":\"27 1\",\"pages\":\"0\"},\"PeriodicalIF\":0.0000,\"publicationDate\":\"2006-05-22\",\"publicationTypes\":\"Journal Article\",\"fieldsOfStudy\":null,\"isOpenAccess\":false,\"openAccessPdf\":\"\",\"citationCount\":\"5\",\"resultStr\":null,\"platform\":\"Semanticscholar\",\"paperid\":null,\"PeriodicalName\":\"The 17th Annual SEMI/IEEE ASMC 2006 Conference\",\"FirstCategoryId\":\"1085\",\"ListUrlMain\":\"https://doi.org/10.1109/ASMC.2006.1638722\",\"RegionNum\":0,\"RegionCategory\":null,\"ArticlePicture\":[],\"TitleCN\":null,\"AbstractTextCN\":null,\"PMCID\":null,\"EPubDate\":\"\",\"PubModel\":\"\",\"JCR\":\"\",\"JCRName\":\"\",\"Score\":null,\"Total\":0}","platform":"Semanticscholar","paperid":null,"PeriodicalName":"The 17th Annual SEMI/IEEE ASMC 2006 Conference","FirstCategoryId":"1085","ListUrlMain":"https://doi.org/10.1109/ASMC.2006.1638722","RegionNum":0,"RegionCategory":null,"ArticlePicture":[],"TitleCN":null,"AbstractTextCN":null,"PMCID":null,"EPubDate":"","PubModel":"","JCR":"","JCRName":"","Score":null,"Total":0}
Performance Evaluation of Serial Photolithography Clusters: Queueing Models, Throughput and Workload Sequencing
For clustered configuration of a photolithography toolset, operating under a scheduling policy inducing serial processing, measures of system performance are deduced. Queueing models demonstrate that, due to the parallelism inherent in the system configuration, the normalized cycle time behavior is different than that of the standard single server queue. Cluster throughput is evaluated based on measures of the frequency and magnitude of events common in manufacturing operation. It is shown that the maximum throughput of a serial photolithography cluster tool is not influenced by the order in which two classes of lots with different wafer processing speeds are processed
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