D. Losee, J. C. Cassidy, M. Mehra, E. Nelson, B. Burkey, G. Geisbuesch, G. Hawkins, R. Khosla, J. P. Lavine, W. Mccolgin, E. A. Trabka, A.K. Weiss
{"title":"一种1/3”格式的图像传感器,带有耐火金属遮光罩,适用于彩色视频应用","authors":"D. Losee, J. C. Cassidy, M. Mehra, E. Nelson, B. Burkey, G. Geisbuesch, G. Hawkins, R. Khosla, J. P. Lavine, W. Mccolgin, E. A. Trabka, A.K. Weiss","doi":"10.1109/ISSCC.1989.48194","DOIUrl":null,"url":null,"abstract":"The authors report results obtained on a full-color interline transfer CCD (charged-coupled device) image sensor with pixel dimensions of 8.6 mu m(H)*6.8 mu m(V) using 1.2- mu m design rules and a two-phase, single-polysilicon-per-phase technology. In order to reduce image smear and to provide suitable topography for integral color filters, a refractory light shield with a flowed glass overlayer was incorporated. The basic sensor and pixel architecture is shown. Image smear as a percent of full well, measured with 10% vertical illumination at saturated intensity, is shown as a function of wavelength. Smear is lowest at short wavelengths but is at an acceptable level for applications with controlled illumination.<<ETX>>","PeriodicalId":385838,"journal":{"name":"IEEE International Solid-State Circuits Conference, 1989 ISSCC. Digest of Technical Papers","volume":"31 1","pages":"0"},"PeriodicalIF":0.0000,"publicationDate":"1989-02-15","publicationTypes":"Journal Article","fieldsOfStudy":null,"isOpenAccess":false,"openAccessPdf":"","citationCount":"14","resultStr":"{\"title\":\"A 1/3\\\" format image sensor with refractory metal light shield for color video applications\",\"authors\":\"D. Losee, J. C. Cassidy, M. Mehra, E. Nelson, B. Burkey, G. Geisbuesch, G. Hawkins, R. Khosla, J. P. Lavine, W. Mccolgin, E. A. Trabka, A.K. Weiss\",\"doi\":\"10.1109/ISSCC.1989.48194\",\"DOIUrl\":null,\"url\":null,\"abstract\":\"The authors report results obtained on a full-color interline transfer CCD (charged-coupled device) image sensor with pixel dimensions of 8.6 mu m(H)*6.8 mu m(V) using 1.2- mu m design rules and a two-phase, single-polysilicon-per-phase technology. In order to reduce image smear and to provide suitable topography for integral color filters, a refractory light shield with a flowed glass overlayer was incorporated. The basic sensor and pixel architecture is shown. Image smear as a percent of full well, measured with 10% vertical illumination at saturated intensity, is shown as a function of wavelength. Smear is lowest at short wavelengths but is at an acceptable level for applications with controlled illumination.<<ETX>>\",\"PeriodicalId\":385838,\"journal\":{\"name\":\"IEEE International Solid-State Circuits Conference, 1989 ISSCC. Digest of Technical Papers\",\"volume\":\"31 1\",\"pages\":\"0\"},\"PeriodicalIF\":0.0000,\"publicationDate\":\"1989-02-15\",\"publicationTypes\":\"Journal Article\",\"fieldsOfStudy\":null,\"isOpenAccess\":false,\"openAccessPdf\":\"\",\"citationCount\":\"14\",\"resultStr\":null,\"platform\":\"Semanticscholar\",\"paperid\":null,\"PeriodicalName\":\"IEEE International Solid-State Circuits Conference, 1989 ISSCC. Digest of Technical Papers\",\"FirstCategoryId\":\"1085\",\"ListUrlMain\":\"https://doi.org/10.1109/ISSCC.1989.48194\",\"RegionNum\":0,\"RegionCategory\":null,\"ArticlePicture\":[],\"TitleCN\":null,\"AbstractTextCN\":null,\"PMCID\":null,\"EPubDate\":\"\",\"PubModel\":\"\",\"JCR\":\"\",\"JCRName\":\"\",\"Score\":null,\"Total\":0}","platform":"Semanticscholar","paperid":null,"PeriodicalName":"IEEE International Solid-State Circuits Conference, 1989 ISSCC. Digest of Technical Papers","FirstCategoryId":"1085","ListUrlMain":"https://doi.org/10.1109/ISSCC.1989.48194","RegionNum":0,"RegionCategory":null,"ArticlePicture":[],"TitleCN":null,"AbstractTextCN":null,"PMCID":null,"EPubDate":"","PubModel":"","JCR":"","JCRName":"","Score":null,"Total":0}
A 1/3" format image sensor with refractory metal light shield for color video applications
The authors report results obtained on a full-color interline transfer CCD (charged-coupled device) image sensor with pixel dimensions of 8.6 mu m(H)*6.8 mu m(V) using 1.2- mu m design rules and a two-phase, single-polysilicon-per-phase technology. In order to reduce image smear and to provide suitable topography for integral color filters, a refractory light shield with a flowed glass overlayer was incorporated. The basic sensor and pixel architecture is shown. Image smear as a percent of full well, measured with 10% vertical illumination at saturated intensity, is shown as a function of wavelength. Smear is lowest at short wavelengths but is at an acceptable level for applications with controlled illumination.<>