阈值电压和电流变异性与界面陷阱空间分布有关

V. Velayudhan, J. Martín-Martínez, M. Porti, Carlos Couso, R. Rodríguez, M. Nafría, X. Aymerich, C. Márquez, F. Gámiz
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引用次数: 4

摘要

界面陷阱可能是mosfet中可变性的来源,导致器件的统计分布电特性。本文从三维TCAD仿真出发,讨论了界面陷阱的空间分布对mosfet阈值电压和导通电流变异性的影响。结果表明,阈值电压主要受阱沿器件沟道分布的影响,而导通电流也受阱沿器件宽度排列的影响。讨论了器件电对称性的意义。
本文章由计算机程序翻译,如有差异,请以英文原文为准。
Threshold voltage and on-current Variability related to interface traps spatial distribution
Interface traps can be a source of variability in MOSFETs, leading to statistically distributed electrical characteristics of devices. This work discusses, from 3D TCAD simulations, the effect of the spatial distribution of interface traps on the variability of the threshold voltage and the on-current of MOSFETs. The results suggest that threshold voltage is mainly influenced by the trap distribution along the channel of the device, whereas on-current is also influenced by the alignment of the traps along the device width. Implications for device electrical symmetry are discussed.
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