{"title":"千兆电介质蚀刻:挑战和解决方案","authors":"H. Shan","doi":"10.1109/IMNC.1999.797553","DOIUrl":null,"url":null,"abstract":"Moore's law has generally guided the semiconductor micro-fabrication for the last three decades. Along this trend, a giga era is approaching: gigabit memory devices and giga Hertz microprocessors will be developed around the millennium. The author first discusses both technological and economical challenges to dielectric etch of the gigaera, from a semiconductor equipment vendor's point of view, then presents some of recently developed solutions.","PeriodicalId":120440,"journal":{"name":"Digest of Papers. Microprocesses and Nanotechnology '99. 1999 International Microprocesses and Nanotechnology Conference","volume":"57 1","pages":"0"},"PeriodicalIF":0.0000,"publicationDate":"1900-01-01","publicationTypes":"Journal Article","fieldsOfStudy":null,"isOpenAccess":false,"openAccessPdf":"","citationCount":"0","resultStr":"{\"title\":\"Giga-era dielectric etch: challenges and solutions\",\"authors\":\"H. Shan\",\"doi\":\"10.1109/IMNC.1999.797553\",\"DOIUrl\":null,\"url\":null,\"abstract\":\"Moore's law has generally guided the semiconductor micro-fabrication for the last three decades. Along this trend, a giga era is approaching: gigabit memory devices and giga Hertz microprocessors will be developed around the millennium. The author first discusses both technological and economical challenges to dielectric etch of the gigaera, from a semiconductor equipment vendor's point of view, then presents some of recently developed solutions.\",\"PeriodicalId\":120440,\"journal\":{\"name\":\"Digest of Papers. Microprocesses and Nanotechnology '99. 1999 International Microprocesses and Nanotechnology Conference\",\"volume\":\"57 1\",\"pages\":\"0\"},\"PeriodicalIF\":0.0000,\"publicationDate\":\"1900-01-01\",\"publicationTypes\":\"Journal Article\",\"fieldsOfStudy\":null,\"isOpenAccess\":false,\"openAccessPdf\":\"\",\"citationCount\":\"0\",\"resultStr\":null,\"platform\":\"Semanticscholar\",\"paperid\":null,\"PeriodicalName\":\"Digest of Papers. Microprocesses and Nanotechnology '99. 1999 International Microprocesses and Nanotechnology Conference\",\"FirstCategoryId\":\"1085\",\"ListUrlMain\":\"https://doi.org/10.1109/IMNC.1999.797553\",\"RegionNum\":0,\"RegionCategory\":null,\"ArticlePicture\":[],\"TitleCN\":null,\"AbstractTextCN\":null,\"PMCID\":null,\"EPubDate\":\"\",\"PubModel\":\"\",\"JCR\":\"\",\"JCRName\":\"\",\"Score\":null,\"Total\":0}","platform":"Semanticscholar","paperid":null,"PeriodicalName":"Digest of Papers. Microprocesses and Nanotechnology '99. 1999 International Microprocesses and Nanotechnology Conference","FirstCategoryId":"1085","ListUrlMain":"https://doi.org/10.1109/IMNC.1999.797553","RegionNum":0,"RegionCategory":null,"ArticlePicture":[],"TitleCN":null,"AbstractTextCN":null,"PMCID":null,"EPubDate":"","PubModel":"","JCR":"","JCRName":"","Score":null,"Total":0}
Giga-era dielectric etch: challenges and solutions
Moore's law has generally guided the semiconductor micro-fabrication for the last three decades. Along this trend, a giga era is approaching: gigabit memory devices and giga Hertz microprocessors will be developed around the millennium. The author first discusses both technological and economical challenges to dielectric etch of the gigaera, from a semiconductor equipment vendor's point of view, then presents some of recently developed solutions.