{"title":"外源电容对GSMBE生长的Ga/sub 0.51/In/sub 0.49/P/GaAs misfet (0 nm/spl les/t/spl les/10 nm)微波性能的影响","authors":"Yo‐Sheng Lin, Shey-Shi Lu","doi":"10.1109/SMICND.1996.557478","DOIUrl":null,"url":null,"abstract":"The effect of extrinsic capacitances on the microwave performance of Ga/sub 0.51/In/sub 0.49/P/GaAs MISFETs was first studied experimentally and theoretically by varying the thickness of the Ga/sub 0.51/In/sub 0.49/P insulating layer. MISFETs with airbridge gate structure showed higher f/sub t/s, and f/sub max/s than those of MISFETs with traditional gate structure due to the lower extrinsic capacitances. Moreover, the maximum values of f/sub t/s, and f/sub max/s for a 1 /spl mu/m gate length device all happen when t is between 50 nm and 100 nm. These results demonstrate that Ga/sub 0.51/In/sub 0.49/P/GaAs airbridge gate MISFETs with insulator thickness between 50 nm and 100 nm were very suitable for microwave high power device applications.","PeriodicalId":266178,"journal":{"name":"1996 International Semiconductor Conference. 19th Edition. CAS'96 Proceedings","volume":"26 1","pages":"0"},"PeriodicalIF":0.0000,"publicationDate":"1996-10-09","publicationTypes":"Journal Article","fieldsOfStudy":null,"isOpenAccess":false,"openAccessPdf":"","citationCount":"0","resultStr":"{\"title\":\"The effect of extrinsic capacitances on the microwave performance of Ga/sub 0.51/In/sub 0.49/P/GaAs MISFETs (0 nm/spl les/t/spl les/10 nm) grown by GSMBE\",\"authors\":\"Yo‐Sheng Lin, Shey-Shi Lu\",\"doi\":\"10.1109/SMICND.1996.557478\",\"DOIUrl\":null,\"url\":null,\"abstract\":\"The effect of extrinsic capacitances on the microwave performance of Ga/sub 0.51/In/sub 0.49/P/GaAs MISFETs was first studied experimentally and theoretically by varying the thickness of the Ga/sub 0.51/In/sub 0.49/P insulating layer. MISFETs with airbridge gate structure showed higher f/sub t/s, and f/sub max/s than those of MISFETs with traditional gate structure due to the lower extrinsic capacitances. Moreover, the maximum values of f/sub t/s, and f/sub max/s for a 1 /spl mu/m gate length device all happen when t is between 50 nm and 100 nm. These results demonstrate that Ga/sub 0.51/In/sub 0.49/P/GaAs airbridge gate MISFETs with insulator thickness between 50 nm and 100 nm were very suitable for microwave high power device applications.\",\"PeriodicalId\":266178,\"journal\":{\"name\":\"1996 International Semiconductor Conference. 19th Edition. CAS'96 Proceedings\",\"volume\":\"26 1\",\"pages\":\"0\"},\"PeriodicalIF\":0.0000,\"publicationDate\":\"1996-10-09\",\"publicationTypes\":\"Journal Article\",\"fieldsOfStudy\":null,\"isOpenAccess\":false,\"openAccessPdf\":\"\",\"citationCount\":\"0\",\"resultStr\":null,\"platform\":\"Semanticscholar\",\"paperid\":null,\"PeriodicalName\":\"1996 International Semiconductor Conference. 19th Edition. CAS'96 Proceedings\",\"FirstCategoryId\":\"1085\",\"ListUrlMain\":\"https://doi.org/10.1109/SMICND.1996.557478\",\"RegionNum\":0,\"RegionCategory\":null,\"ArticlePicture\":[],\"TitleCN\":null,\"AbstractTextCN\":null,\"PMCID\":null,\"EPubDate\":\"\",\"PubModel\":\"\",\"JCR\":\"\",\"JCRName\":\"\",\"Score\":null,\"Total\":0}","platform":"Semanticscholar","paperid":null,"PeriodicalName":"1996 International Semiconductor Conference. 19th Edition. CAS'96 Proceedings","FirstCategoryId":"1085","ListUrlMain":"https://doi.org/10.1109/SMICND.1996.557478","RegionNum":0,"RegionCategory":null,"ArticlePicture":[],"TitleCN":null,"AbstractTextCN":null,"PMCID":null,"EPubDate":"","PubModel":"","JCR":"","JCRName":"","Score":null,"Total":0}
The effect of extrinsic capacitances on the microwave performance of Ga/sub 0.51/In/sub 0.49/P/GaAs MISFETs (0 nm/spl les/t/spl les/10 nm) grown by GSMBE
The effect of extrinsic capacitances on the microwave performance of Ga/sub 0.51/In/sub 0.49/P/GaAs MISFETs was first studied experimentally and theoretically by varying the thickness of the Ga/sub 0.51/In/sub 0.49/P insulating layer. MISFETs with airbridge gate structure showed higher f/sub t/s, and f/sub max/s than those of MISFETs with traditional gate structure due to the lower extrinsic capacitances. Moreover, the maximum values of f/sub t/s, and f/sub max/s for a 1 /spl mu/m gate length device all happen when t is between 50 nm and 100 nm. These results demonstrate that Ga/sub 0.51/In/sub 0.49/P/GaAs airbridge gate MISFETs with insulator thickness between 50 nm and 100 nm were very suitable for microwave high power device applications.