{"title":"一个符号交互设计系统","authors":"D. Clary, R. Kirk, S. Sapiro","doi":"10.1145/800139.804542","DOIUrl":null,"url":null,"abstract":"A new production approach to IC mask layout/checking is described which makes use of a combination of symbolic layout, computer checking and color graphics to resolve some of the problems in currently available layout systems. Techniques such as on-line design rule and connectivity checking, not found in other production systems, give the user \"instant\" feedback as he is designing.","PeriodicalId":196513,"journal":{"name":"17th Design Automation Conference","volume":"3 1","pages":"0"},"PeriodicalIF":0.0000,"publicationDate":"1980-06-23","publicationTypes":"Journal Article","fieldsOfStudy":null,"isOpenAccess":false,"openAccessPdf":"","citationCount":"4","resultStr":"{\"title\":\"SIDS - A Symbolic Interactive Design System\",\"authors\":\"D. Clary, R. Kirk, S. Sapiro\",\"doi\":\"10.1145/800139.804542\",\"DOIUrl\":null,\"url\":null,\"abstract\":\"A new production approach to IC mask layout/checking is described which makes use of a combination of symbolic layout, computer checking and color graphics to resolve some of the problems in currently available layout systems. Techniques such as on-line design rule and connectivity checking, not found in other production systems, give the user \\\"instant\\\" feedback as he is designing.\",\"PeriodicalId\":196513,\"journal\":{\"name\":\"17th Design Automation Conference\",\"volume\":\"3 1\",\"pages\":\"0\"},\"PeriodicalIF\":0.0000,\"publicationDate\":\"1980-06-23\",\"publicationTypes\":\"Journal Article\",\"fieldsOfStudy\":null,\"isOpenAccess\":false,\"openAccessPdf\":\"\",\"citationCount\":\"4\",\"resultStr\":null,\"platform\":\"Semanticscholar\",\"paperid\":null,\"PeriodicalName\":\"17th Design Automation Conference\",\"FirstCategoryId\":\"1085\",\"ListUrlMain\":\"https://doi.org/10.1145/800139.804542\",\"RegionNum\":0,\"RegionCategory\":null,\"ArticlePicture\":[],\"TitleCN\":null,\"AbstractTextCN\":null,\"PMCID\":null,\"EPubDate\":\"\",\"PubModel\":\"\",\"JCR\":\"\",\"JCRName\":\"\",\"Score\":null,\"Total\":0}","platform":"Semanticscholar","paperid":null,"PeriodicalName":"17th Design Automation Conference","FirstCategoryId":"1085","ListUrlMain":"https://doi.org/10.1145/800139.804542","RegionNum":0,"RegionCategory":null,"ArticlePicture":[],"TitleCN":null,"AbstractTextCN":null,"PMCID":null,"EPubDate":"","PubModel":"","JCR":"","JCRName":"","Score":null,"Total":0}
A new production approach to IC mask layout/checking is described which makes use of a combination of symbolic layout, computer checking and color graphics to resolve some of the problems in currently available layout systems. Techniques such as on-line design rule and connectivity checking, not found in other production systems, give the user "instant" feedback as he is designing.
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