H. Heiss, D. Xu, S. Kraus, M. Sexl, G. Bohm, G. Trankle, G. Weimann
{"title":"0.15 /spl mu/m栅极对InAlAs/InGaAs hemt输出电导的降低","authors":"H. Heiss, D. Xu, S. Kraus, M. Sexl, G. Bohm, G. Trankle, G. Weimann","doi":"10.1109/ICIPRM.1996.492284","DOIUrl":null,"url":null,"abstract":"We have optimized the layer structure and the width of lateral gate recess in lattice matched InAlAs/InGaAs High Electron Mobility Transistors (HEMTs) to reduce the output conductance and kink-effect. Very low output conductances less than 30 mS/mm lead to excellent f/sub max/-values (maximum stable gain) of more than 320 GHz for gate lengths of 0.51 /spl mu/m.","PeriodicalId":268278,"journal":{"name":"Proceedings of 8th International Conference on Indium Phosphide and Related Materials","volume":"2 1","pages":"0"},"PeriodicalIF":0.0000,"publicationDate":"1996-04-21","publicationTypes":"Journal Article","fieldsOfStudy":null,"isOpenAccess":false,"openAccessPdf":"","citationCount":"1","resultStr":"{\"title\":\"Reduction of the output conductance in InAlAs/InGaAs HEMTs with 0.15 /spl mu/m gates\",\"authors\":\"H. Heiss, D. Xu, S. Kraus, M. Sexl, G. Bohm, G. Trankle, G. Weimann\",\"doi\":\"10.1109/ICIPRM.1996.492284\",\"DOIUrl\":null,\"url\":null,\"abstract\":\"We have optimized the layer structure and the width of lateral gate recess in lattice matched InAlAs/InGaAs High Electron Mobility Transistors (HEMTs) to reduce the output conductance and kink-effect. Very low output conductances less than 30 mS/mm lead to excellent f/sub max/-values (maximum stable gain) of more than 320 GHz for gate lengths of 0.51 /spl mu/m.\",\"PeriodicalId\":268278,\"journal\":{\"name\":\"Proceedings of 8th International Conference on Indium Phosphide and Related Materials\",\"volume\":\"2 1\",\"pages\":\"0\"},\"PeriodicalIF\":0.0000,\"publicationDate\":\"1996-04-21\",\"publicationTypes\":\"Journal Article\",\"fieldsOfStudy\":null,\"isOpenAccess\":false,\"openAccessPdf\":\"\",\"citationCount\":\"1\",\"resultStr\":null,\"platform\":\"Semanticscholar\",\"paperid\":null,\"PeriodicalName\":\"Proceedings of 8th International Conference on Indium Phosphide and Related Materials\",\"FirstCategoryId\":\"1085\",\"ListUrlMain\":\"https://doi.org/10.1109/ICIPRM.1996.492284\",\"RegionNum\":0,\"RegionCategory\":null,\"ArticlePicture\":[],\"TitleCN\":null,\"AbstractTextCN\":null,\"PMCID\":null,\"EPubDate\":\"\",\"PubModel\":\"\",\"JCR\":\"\",\"JCRName\":\"\",\"Score\":null,\"Total\":0}","platform":"Semanticscholar","paperid":null,"PeriodicalName":"Proceedings of 8th International Conference on Indium Phosphide and Related Materials","FirstCategoryId":"1085","ListUrlMain":"https://doi.org/10.1109/ICIPRM.1996.492284","RegionNum":0,"RegionCategory":null,"ArticlePicture":[],"TitleCN":null,"AbstractTextCN":null,"PMCID":null,"EPubDate":"","PubModel":"","JCR":"","JCRName":"","Score":null,"Total":0}
Reduction of the output conductance in InAlAs/InGaAs HEMTs with 0.15 /spl mu/m gates
We have optimized the layer structure and the width of lateral gate recess in lattice matched InAlAs/InGaAs High Electron Mobility Transistors (HEMTs) to reduce the output conductance and kink-effect. Very low output conductances less than 30 mS/mm lead to excellent f/sub max/-values (maximum stable gain) of more than 320 GHz for gate lengths of 0.51 /spl mu/m.