0.15 /spl mu/m栅极对InAlAs/InGaAs hemt输出电导的降低

H. Heiss, D. Xu, S. Kraus, M. Sexl, G. Bohm, G. Trankle, G. Weimann
{"title":"0.15 /spl mu/m栅极对InAlAs/InGaAs hemt输出电导的降低","authors":"H. Heiss, D. Xu, S. Kraus, M. Sexl, G. Bohm, G. Trankle, G. Weimann","doi":"10.1109/ICIPRM.1996.492284","DOIUrl":null,"url":null,"abstract":"We have optimized the layer structure and the width of lateral gate recess in lattice matched InAlAs/InGaAs High Electron Mobility Transistors (HEMTs) to reduce the output conductance and kink-effect. Very low output conductances less than 30 mS/mm lead to excellent f/sub max/-values (maximum stable gain) of more than 320 GHz for gate lengths of 0.51 /spl mu/m.","PeriodicalId":268278,"journal":{"name":"Proceedings of 8th International Conference on Indium Phosphide and Related Materials","volume":"2 1","pages":"0"},"PeriodicalIF":0.0000,"publicationDate":"1996-04-21","publicationTypes":"Journal Article","fieldsOfStudy":null,"isOpenAccess":false,"openAccessPdf":"","citationCount":"1","resultStr":"{\"title\":\"Reduction of the output conductance in InAlAs/InGaAs HEMTs with 0.15 /spl mu/m gates\",\"authors\":\"H. Heiss, D. Xu, S. Kraus, M. Sexl, G. Bohm, G. Trankle, G. Weimann\",\"doi\":\"10.1109/ICIPRM.1996.492284\",\"DOIUrl\":null,\"url\":null,\"abstract\":\"We have optimized the layer structure and the width of lateral gate recess in lattice matched InAlAs/InGaAs High Electron Mobility Transistors (HEMTs) to reduce the output conductance and kink-effect. Very low output conductances less than 30 mS/mm lead to excellent f/sub max/-values (maximum stable gain) of more than 320 GHz for gate lengths of 0.51 /spl mu/m.\",\"PeriodicalId\":268278,\"journal\":{\"name\":\"Proceedings of 8th International Conference on Indium Phosphide and Related Materials\",\"volume\":\"2 1\",\"pages\":\"0\"},\"PeriodicalIF\":0.0000,\"publicationDate\":\"1996-04-21\",\"publicationTypes\":\"Journal Article\",\"fieldsOfStudy\":null,\"isOpenAccess\":false,\"openAccessPdf\":\"\",\"citationCount\":\"1\",\"resultStr\":null,\"platform\":\"Semanticscholar\",\"paperid\":null,\"PeriodicalName\":\"Proceedings of 8th International Conference on Indium Phosphide and Related Materials\",\"FirstCategoryId\":\"1085\",\"ListUrlMain\":\"https://doi.org/10.1109/ICIPRM.1996.492284\",\"RegionNum\":0,\"RegionCategory\":null,\"ArticlePicture\":[],\"TitleCN\":null,\"AbstractTextCN\":null,\"PMCID\":null,\"EPubDate\":\"\",\"PubModel\":\"\",\"JCR\":\"\",\"JCRName\":\"\",\"Score\":null,\"Total\":0}","platform":"Semanticscholar","paperid":null,"PeriodicalName":"Proceedings of 8th International Conference on Indium Phosphide and Related Materials","FirstCategoryId":"1085","ListUrlMain":"https://doi.org/10.1109/ICIPRM.1996.492284","RegionNum":0,"RegionCategory":null,"ArticlePicture":[],"TitleCN":null,"AbstractTextCN":null,"PMCID":null,"EPubDate":"","PubModel":"","JCR":"","JCRName":"","Score":null,"Total":0}
引用次数: 1

摘要

本文通过优化晶格匹配InAlAs/InGaAs高电子迁移率晶体管(HEMTs)的层结构和横向栅极凹槽宽度,来降低输出电导和扭结效应。极低的输出电导小于30 mS/mm,使得栅极长度为0.51 /spl mu/m时,f/sub max/-值(最大稳定增益)超过320 GHz。
本文章由计算机程序翻译,如有差异,请以英文原文为准。
Reduction of the output conductance in InAlAs/InGaAs HEMTs with 0.15 /spl mu/m gates
We have optimized the layer structure and the width of lateral gate recess in lattice matched InAlAs/InGaAs High Electron Mobility Transistors (HEMTs) to reduce the output conductance and kink-effect. Very low output conductances less than 30 mS/mm lead to excellent f/sub max/-values (maximum stable gain) of more than 320 GHz for gate lengths of 0.51 /spl mu/m.
求助全文
通过发布文献求助,成功后即可免费获取论文全文。 去求助
来源期刊
自引率
0.00%
发文量
0
×
引用
GB/T 7714-2015
复制
MLA
复制
APA
复制
导出至
BibTeX EndNote RefMan NoteFirst NoteExpress
×
提示
您的信息不完整,为了账户安全,请先补充。
现在去补充
×
提示
您因"违规操作"
具体请查看互助需知
我知道了
×
提示
确定
请完成安全验证×
copy
已复制链接
快去分享给好友吧!
我知道了
右上角分享
点击右上角分享
0
联系我们:info@booksci.cn Book学术提供免费学术资源搜索服务,方便国内外学者检索中英文文献。致力于提供最便捷和优质的服务体验。 Copyright © 2023 布克学术 All rights reserved.
京ICP备2023020795号-1
ghs 京公网安备 11010802042870号
Book学术文献互助
Book学术文献互助群
群 号:604180095
Book学术官方微信