衬底位置对反应溅射ZnO薄膜结构、形态和光学性能的影响

2016 13th International Conference on Electrical Engineering, Computing Science and Automatic Control (CCE) Pub Date : 2016-09-01 DOI:10.1109/ICEEE.2016.7751209

J. V. Kumar, Y. Matsumoto, A. Maldonado-Alvarez, M. D. L. L. Olvera-Amador

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引用次数: 0

摘要

在这项工作中，我们通过在衬底支架的不同位置放置衬底来研究ZnO薄膜的结构，形态和光学性质。采用反应射频(RF)溅射法，在100W下在玻璃衬底上生长ZnO薄膜。XRD结构分析结果表明，ZnO薄膜沿(002)平面生长。形态学研究表明，ZnO纳米颗粒形成了薄膜。紫外-可见区的光学测量结果表明，其平均透过率>90%。

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Effect of substrate position on Structural, Morphological, and optical properties of reactively sputtered ZnO thin films

In this work, we have investigated the structural, morphological, and optical properties of ZnO thin films by placing the substrate at different locations of the substrate holder. ZnO thin films were grown on glass substrates by reactive radio frequency (RF) sputtering at 100W. Structural results obtained from XRD revealed that ZnO thin films were grown along (002) plane. Morphological studies showed that films were formed from nanograins of ZnO. Optical measurements in the UV-vis region presented an average transmittance >90%.

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2016 13th International Conference on Electrical Engineering, Computing Science and Automatic Control (CCE)

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