Chen Chao, M. I. Markevich, F.A. Piskonov, A. Chaplanov, G. Ivlev
{"title":"锌注入InP的脉冲激光退火","authors":"Chen Chao, M. I. Markevich, F.A. Piskonov, A. Chaplanov, G. Ivlev","doi":"10.1109/ICSICT.2001.981471","DOIUrl":null,"url":null,"abstract":"The pulsed laser annealing technique can eliminate many induced defects from zinc-implantation InP and change amorphous into mono-crystal on the surface of InP sample. The optimal annealing condition for pulsed ruby laser is that laser power density is about 0-44J/cm/sup 2/ and time width is 70 ns. If the pulsed laser radiating power density is too high or too low, the surface of sample will produce poly-crystal. On the optimal annealing condition, the shallow p-n junction and the high precipitous accepter concentration distribution have been obtained. The maximum accepter concentration will exceed 10/sup 19/cm/sup -3/. The junction depth is less than 0.12 /spl mu/m. The proposed macro-kinetic model can be employed to explain the phenomenon and the physical processes in pulsed laser annealing.","PeriodicalId":349087,"journal":{"name":"2001 6th International Conference on Solid-State and Integrated Circuit Technology. Proceedings (Cat. No.01EX443)","volume":"18 6","pages":"0"},"PeriodicalIF":0.0000,"publicationDate":"2001-10-22","publicationTypes":"Journal Article","fieldsOfStudy":null,"isOpenAccess":false,"openAccessPdf":"","citationCount":"0","resultStr":"{\"title\":\"Pulsed laser annealing of zinc - implanted InP\",\"authors\":\"Chen Chao, M. I. Markevich, F.A. Piskonov, A. Chaplanov, G. Ivlev\",\"doi\":\"10.1109/ICSICT.2001.981471\",\"DOIUrl\":null,\"url\":null,\"abstract\":\"The pulsed laser annealing technique can eliminate many induced defects from zinc-implantation InP and change amorphous into mono-crystal on the surface of InP sample. The optimal annealing condition for pulsed ruby laser is that laser power density is about 0-44J/cm/sup 2/ and time width is 70 ns. If the pulsed laser radiating power density is too high or too low, the surface of sample will produce poly-crystal. On the optimal annealing condition, the shallow p-n junction and the high precipitous accepter concentration distribution have been obtained. The maximum accepter concentration will exceed 10/sup 19/cm/sup -3/. The junction depth is less than 0.12 /spl mu/m. The proposed macro-kinetic model can be employed to explain the phenomenon and the physical processes in pulsed laser annealing.\",\"PeriodicalId\":349087,\"journal\":{\"name\":\"2001 6th International Conference on Solid-State and Integrated Circuit Technology. Proceedings (Cat. No.01EX443)\",\"volume\":\"18 6\",\"pages\":\"0\"},\"PeriodicalIF\":0.0000,\"publicationDate\":\"2001-10-22\",\"publicationTypes\":\"Journal Article\",\"fieldsOfStudy\":null,\"isOpenAccess\":false,\"openAccessPdf\":\"\",\"citationCount\":\"0\",\"resultStr\":null,\"platform\":\"Semanticscholar\",\"paperid\":null,\"PeriodicalName\":\"2001 6th International Conference on Solid-State and Integrated Circuit Technology. Proceedings (Cat. No.01EX443)\",\"FirstCategoryId\":\"1085\",\"ListUrlMain\":\"https://doi.org/10.1109/ICSICT.2001.981471\",\"RegionNum\":0,\"RegionCategory\":null,\"ArticlePicture\":[],\"TitleCN\":null,\"AbstractTextCN\":null,\"PMCID\":null,\"EPubDate\":\"\",\"PubModel\":\"\",\"JCR\":\"\",\"JCRName\":\"\",\"Score\":null,\"Total\":0}","platform":"Semanticscholar","paperid":null,"PeriodicalName":"2001 6th International Conference on Solid-State and Integrated Circuit Technology. Proceedings (Cat. No.01EX443)","FirstCategoryId":"1085","ListUrlMain":"https://doi.org/10.1109/ICSICT.2001.981471","RegionNum":0,"RegionCategory":null,"ArticlePicture":[],"TitleCN":null,"AbstractTextCN":null,"PMCID":null,"EPubDate":"","PubModel":"","JCR":"","JCRName":"","Score":null,"Total":0}
The pulsed laser annealing technique can eliminate many induced defects from zinc-implantation InP and change amorphous into mono-crystal on the surface of InP sample. The optimal annealing condition for pulsed ruby laser is that laser power density is about 0-44J/cm/sup 2/ and time width is 70 ns. If the pulsed laser radiating power density is too high or too low, the surface of sample will produce poly-crystal. On the optimal annealing condition, the shallow p-n junction and the high precipitous accepter concentration distribution have been obtained. The maximum accepter concentration will exceed 10/sup 19/cm/sup -3/. The junction depth is less than 0.12 /spl mu/m. The proposed macro-kinetic model can be employed to explain the phenomenon and the physical processes in pulsed laser annealing.