Jingnan Cai, Yu Wang, Y. Ishikawa, Y. Yamashita, Y. Kamiura, K. Wada
{"title":"氢等离子体处理用于硅波导平滑","authors":"Jingnan Cai, Yu Wang, Y. Ishikawa, Y. Yamashita, Y. Kamiura, K. Wada","doi":"10.1109/GROUP4.2011.6053727","DOIUrl":null,"url":null,"abstract":"We demonstrated that remote hydrogen plasma treatment on silicon ring resonators can smooth the Si waveguides at lower than 100 °C. This also provides a promising way to trim resonators for a designed add/drop wavelength.","PeriodicalId":141233,"journal":{"name":"8th IEEE International Conference on Group IV Photonics","volume":"171 1","pages":"0"},"PeriodicalIF":0.0000,"publicationDate":"2011-11-01","publicationTypes":"Journal Article","fieldsOfStudy":null,"isOpenAccess":false,"openAccessPdf":"","citationCount":"1","resultStr":"{\"title\":\"Hydrogen plasma treatment for Si waveguide smoothing\",\"authors\":\"Jingnan Cai, Yu Wang, Y. Ishikawa, Y. Yamashita, Y. Kamiura, K. Wada\",\"doi\":\"10.1109/GROUP4.2011.6053727\",\"DOIUrl\":null,\"url\":null,\"abstract\":\"We demonstrated that remote hydrogen plasma treatment on silicon ring resonators can smooth the Si waveguides at lower than 100 °C. This also provides a promising way to trim resonators for a designed add/drop wavelength.\",\"PeriodicalId\":141233,\"journal\":{\"name\":\"8th IEEE International Conference on Group IV Photonics\",\"volume\":\"171 1\",\"pages\":\"0\"},\"PeriodicalIF\":0.0000,\"publicationDate\":\"2011-11-01\",\"publicationTypes\":\"Journal Article\",\"fieldsOfStudy\":null,\"isOpenAccess\":false,\"openAccessPdf\":\"\",\"citationCount\":\"1\",\"resultStr\":null,\"platform\":\"Semanticscholar\",\"paperid\":null,\"PeriodicalName\":\"8th IEEE International Conference on Group IV Photonics\",\"FirstCategoryId\":\"1085\",\"ListUrlMain\":\"https://doi.org/10.1109/GROUP4.2011.6053727\",\"RegionNum\":0,\"RegionCategory\":null,\"ArticlePicture\":[],\"TitleCN\":null,\"AbstractTextCN\":null,\"PMCID\":null,\"EPubDate\":\"\",\"PubModel\":\"\",\"JCR\":\"\",\"JCRName\":\"\",\"Score\":null,\"Total\":0}","platform":"Semanticscholar","paperid":null,"PeriodicalName":"8th IEEE International Conference on Group IV Photonics","FirstCategoryId":"1085","ListUrlMain":"https://doi.org/10.1109/GROUP4.2011.6053727","RegionNum":0,"RegionCategory":null,"ArticlePicture":[],"TitleCN":null,"AbstractTextCN":null,"PMCID":null,"EPubDate":"","PubModel":"","JCR":"","JCRName":"","Score":null,"Total":0}
Hydrogen plasma treatment for Si waveguide smoothing
We demonstrated that remote hydrogen plasma treatment on silicon ring resonators can smooth the Si waveguides at lower than 100 °C. This also provides a promising way to trim resonators for a designed add/drop wavelength.