具有可扩展LEE Flash®-G2 SONOS的高性价比嵌入式非易失性存储器,适用于安全物联网和内存中计算(CiM)应用

K. Nii, Y. Taniguchi, K. Okuyama
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引用次数: 4

摘要

我们介绍了一种经济、可靠、节能的嵌入式闪存技术及其应用。在55纳米块体CMOS技术上,研究了一种双选择门结构的电荷捕获型硅-氧化氮-氧化硅(SONOS)。在28纳米节点以下的先进全耗尽(FD)-SOI或3D Fin-FET器件上具有潜在的可扩展性。TCAD仿真和现有的55纳米平面体硅数据证明了这些方法的可行性。通过SRAM单元和闪存单元的结合,介绍了使用非易失性(NV) SRAM的安全低功耗应用。此外,还介绍了基于闪存的模拟内存计算(CiM),用于边缘计算中的节能人工智能(AI)应用。
本文章由计算机程序翻译,如有差异,请以英文原文为准。
A Cost-Effective Embedded Nonvolatile Memory with Scalable LEE Flash®-G2 SONOS for Secure IoT and Computing-in-Memory (CiM) Applications
We introduce a cost-effective, reliable and energy efficient embedded flash memory technology and its applications. A charge trapping type of Silicon-Oxide-Nitride-Oxide-Silicon (SONOS) with twin select-gates structure has been demonstrated on 55-nm bulk CMOS technology. It is potentially scalable on advanced fully depleted (FD)-SOI or 3D Fin-FET devices below 28-nm node. Those feasibilities are shown by TCAD simulations and existing 55-nm planar bulk silicon data. Secure and low-power applications are introduced that are using nonvolatile (NV)-SRAM by combining with SRAM cell and flash cell. Besides, analog computing-inmemory (CiM) based on flash is also introduced for energy efficient artificial intelligence (AI) applications in edge computing.
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