GaN基JBS二极管异常正导特性的TCAD仿真分析

Qi Zhang, Qianshu Wu, Yapeng Wang, Qiuling Qiu, Zhenxing Liu, Jinwei Zhang, Cheng Li, Yuhao Zhou, Yang Liu
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引用次数: 0

摘要

本文研究了JBS二极管导通电阻随正向偏置增大的异常现象。发现正向偏压主要作用于p型肖特基结,导致相邻p栅格间p-GaN的电位增长速率比n型沟道慢。因此,通道侧PN结反向偏置,减小了JBS二极管的有效导通面积,导致导通电阻增大。在p型肖特基接触处对具有不同肖特基势垒高度的JBS二极管进行了仿真以验证我们的分析。p型肖特基结势垒高度的降低导致阳极电压主要作用于PN结,从而缩短了JBS二极管的横向耗尽区,降低了导通电阻。本文的仿真结果可为后续实验提供参考建议。
本文章由计算机程序翻译,如有差异,请以英文原文为准。
Analysis on abnormal forward conduction properties in GaN based JBS diode by TCAD simulation
Abnormal phenomenon that on-resistance of JBS diode increases with forward bias has been studied in this work. It is found that the forward bias is mainly applied to the p-type Schottky junction, resulting in a slower electric potential increasing rate of p-GaN than n-type channel between adjacent p-grid. Therefore, the lateral PN junction at channel is reversely biased and the effective conduction area of JBS diode reduces, which results in the increase of on-resistance. JBS diodes with different Schottky barrier height at p-type Schottky contact are also simulated to verify our analysis. The decrease of barrier height at p-type Schottky junction results in that the anode voltage is mainly applied to the PN junction, which can shorten the lateral depletion region and decrease the on-resistance of JBS diode. The simulation results in this paper are useful for providing reference advice for following experiments.
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