6H-SiC肖特基二极管和结中的掺杂水平冻结

C. Raynaud, G. Guillot
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引用次数: 2

摘要

导纳光谱被证明是分析大多数载流子陷阱的一种非常方便的工具。我们用这种技术研究了不同n型和p型的6H-SiC肖特基二极管和pn结的不同净掺杂水平,氮和铝分别获得了n型和p型掺杂,对于氮,我们检测到E/sub c/-82 meV和E/sub c/-137 meV两个能级,分别归因于6H-SiC中的六方位和立方位。对于铝,我们通常在测量的活化能中检测到相当大的变化。这种变化应该取决于净掺杂水平,即补偿比。
本文章由计算机程序翻译,如有差异,请以英文原文为准。
Dopant level freeze-out in 6H-SiC Schottky diodes and junctions
Admittance spectroscopy is shown to be a very convenient tool for analysing majority carrier traps. We have studied by this technique different n- and p-type 6H-SiC Schottky diodes and pn junctions for different net doping levels, N-type and p-type doping are obtained by nitrogen and aluminum respectively, For nitrogen, we have detected two energy levels at E/sub c/-82 meV and E/sub c/-137 meV, which are respectively attributed to hexagonal and cubic sites in 6H-SiC. For aluminum, we have generally detected a rather large variation in the measured activation energy. This variation is supposed to depend on the net doping level, that is, on the compensation ratio.
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