具有2.8 W/mm射频功率密度的4h碳化硅介面

J. Palmour, C. Weitzel, K. Nordquist, C. Carter
{"title":"具有2.8 W/mm射频功率密度的4h碳化硅介面","authors":"J. Palmour, C. Weitzel, K. Nordquist, C. Carter","doi":"10.1109/DRC.1994.1009401","DOIUrl":null,"url":null,"abstract":"Silicon carbide has tremendous potential for high power microwave devices because of its high breakdown electric field (4x106 V/cm), high thermal conductivity (4.9 W/cm-K), high saturated electron drift velocity ( 2 . 0 ~ 107 cm/sec) and low dielectric constant (10.0). The high velocity allows the devices to operate at relatively high frequencies despite the low mobility of S i c . The high breakdown field allows about ten times higher voltages to be applied for a given channel doping, which should allow a much higher output power density to be achieved than with Si or GaAsl . Submicron MESFETs have been previously fabricated in 6H-Sic and have shown desirable microwave performance with RF output powers of about 1 W/mm at 1-2 G H Z ~ ~ ~ . However, another polytype, 4H-SiC, shows even more potential for high power, high frequency operation, because its electron mobility (>550 cm2/V-sec) is about twice that of 6H-Sic. Thus we report the first DC, S-parameter, and output power results obtained with 4H-Sic MESFETs.","PeriodicalId":244069,"journal":{"name":"52nd Annual Device Research Conference","volume":"79 1","pages":"0"},"PeriodicalIF":0.0000,"publicationDate":"1994-06-20","publicationTypes":"Journal Article","fieldsOfStudy":null,"isOpenAccess":false,"openAccessPdf":"","citationCount":"2","resultStr":"{\"title\":\"4H-silicon carbide mesfet with 2.8 W/mm rf power density\",\"authors\":\"J. Palmour, C. Weitzel, K. Nordquist, C. Carter\",\"doi\":\"10.1109/DRC.1994.1009401\",\"DOIUrl\":null,\"url\":null,\"abstract\":\"Silicon carbide has tremendous potential for high power microwave devices because of its high breakdown electric field (4x106 V/cm), high thermal conductivity (4.9 W/cm-K), high saturated electron drift velocity ( 2 . 0 ~ 107 cm/sec) and low dielectric constant (10.0). The high velocity allows the devices to operate at relatively high frequencies despite the low mobility of S i c . The high breakdown field allows about ten times higher voltages to be applied for a given channel doping, which should allow a much higher output power density to be achieved than with Si or GaAsl . Submicron MESFETs have been previously fabricated in 6H-Sic and have shown desirable microwave performance with RF output powers of about 1 W/mm at 1-2 G H Z ~ ~ ~ . However, another polytype, 4H-SiC, shows even more potential for high power, high frequency operation, because its electron mobility (>550 cm2/V-sec) is about twice that of 6H-Sic. Thus we report the first DC, S-parameter, and output power results obtained with 4H-Sic MESFETs.\",\"PeriodicalId\":244069,\"journal\":{\"name\":\"52nd Annual Device Research Conference\",\"volume\":\"79 1\",\"pages\":\"0\"},\"PeriodicalIF\":0.0000,\"publicationDate\":\"1994-06-20\",\"publicationTypes\":\"Journal Article\",\"fieldsOfStudy\":null,\"isOpenAccess\":false,\"openAccessPdf\":\"\",\"citationCount\":\"2\",\"resultStr\":null,\"platform\":\"Semanticscholar\",\"paperid\":null,\"PeriodicalName\":\"52nd Annual Device Research Conference\",\"FirstCategoryId\":\"1085\",\"ListUrlMain\":\"https://doi.org/10.1109/DRC.1994.1009401\",\"RegionNum\":0,\"RegionCategory\":null,\"ArticlePicture\":[],\"TitleCN\":null,\"AbstractTextCN\":null,\"PMCID\":null,\"EPubDate\":\"\",\"PubModel\":\"\",\"JCR\":\"\",\"JCRName\":\"\",\"Score\":null,\"Total\":0}","platform":"Semanticscholar","paperid":null,"PeriodicalName":"52nd Annual Device Research Conference","FirstCategoryId":"1085","ListUrlMain":"https://doi.org/10.1109/DRC.1994.1009401","RegionNum":0,"RegionCategory":null,"ArticlePicture":[],"TitleCN":null,"AbstractTextCN":null,"PMCID":null,"EPubDate":"","PubModel":"","JCR":"","JCRName":"","Score":null,"Total":0}
引用次数: 2

摘要

碳化硅具有高击穿电场(4x106 V/cm)、高导热系数(4.9 W/cm- k)、高饱和电子漂移速度(2。0 ~ 107 cm/sec)和低介电常数(10.0)。高速度允许器件在相对高的频率下工作,尽管低迁移率的超导。高击穿场允许对给定通道掺杂施加大约十倍高的电压,这应该允许比Si或GaAsl实现更高的输出功率密度。亚微米mesfet先前已在6H-Sic中制造,并显示出理想的微波性能,在1-2 G H Z下RF输出功率约为1 W/mm。然而,另一种多型,4H-SiC,显示出更大的潜力,高功率,高频工作,因为它的电子迁移率(bbb5050cm2 /V-sec)大约是6H-Sic的两倍。因此,我们报告了用4H-Sic mesfet获得的第一个直流、s参数和输出功率结果。
本文章由计算机程序翻译,如有差异,请以英文原文为准。
4H-silicon carbide mesfet with 2.8 W/mm rf power density
Silicon carbide has tremendous potential for high power microwave devices because of its high breakdown electric field (4x106 V/cm), high thermal conductivity (4.9 W/cm-K), high saturated electron drift velocity ( 2 . 0 ~ 107 cm/sec) and low dielectric constant (10.0). The high velocity allows the devices to operate at relatively high frequencies despite the low mobility of S i c . The high breakdown field allows about ten times higher voltages to be applied for a given channel doping, which should allow a much higher output power density to be achieved than with Si or GaAsl . Submicron MESFETs have been previously fabricated in 6H-Sic and have shown desirable microwave performance with RF output powers of about 1 W/mm at 1-2 G H Z ~ ~ ~ . However, another polytype, 4H-SiC, shows even more potential for high power, high frequency operation, because its electron mobility (>550 cm2/V-sec) is about twice that of 6H-Sic. Thus we report the first DC, S-parameter, and output power results obtained with 4H-Sic MESFETs.
求助全文
通过发布文献求助,成功后即可免费获取论文全文。 去求助
来源期刊
自引率
0.00%
发文量
0
×
引用
GB/T 7714-2015
复制
MLA
复制
APA
复制
导出至
BibTeX EndNote RefMan NoteFirst NoteExpress
×
提示
您的信息不完整,为了账户安全,请先补充。
现在去补充
×
提示
您因"违规操作"
具体请查看互助需知
我知道了
×
提示
确定
请完成安全验证×
copy
已复制链接
快去分享给好友吧!
我知道了
右上角分享
点击右上角分享
0
联系我们:info@booksci.cn Book学术提供免费学术资源搜索服务,方便国内外学者检索中英文文献。致力于提供最便捷和优质的服务体验。 Copyright © 2023 布克学术 All rights reserved.
京ICP备2023020795号-1
ghs 京公网安备 11010802042870号
Book学术文献互助
Book学术文献互助群
群 号:481959085
Book学术官方微信