{"title":"具有2.8 W/mm射频功率密度的4h碳化硅介面","authors":"J. Palmour, C. Weitzel, K. Nordquist, C. Carter","doi":"10.1109/DRC.1994.1009401","DOIUrl":null,"url":null,"abstract":"Silicon carbide has tremendous potential for high power microwave devices because of its high breakdown electric field (4x106 V/cm), high thermal conductivity (4.9 W/cm-K), high saturated electron drift velocity ( 2 . 0 ~ 107 cm/sec) and low dielectric constant (10.0). The high velocity allows the devices to operate at relatively high frequencies despite the low mobility of S i c . The high breakdown field allows about ten times higher voltages to be applied for a given channel doping, which should allow a much higher output power density to be achieved than with Si or GaAsl . Submicron MESFETs have been previously fabricated in 6H-Sic and have shown desirable microwave performance with RF output powers of about 1 W/mm at 1-2 G H Z ~ ~ ~ . However, another polytype, 4H-SiC, shows even more potential for high power, high frequency operation, because its electron mobility (>550 cm2/V-sec) is about twice that of 6H-Sic. Thus we report the first DC, S-parameter, and output power results obtained with 4H-Sic MESFETs.","PeriodicalId":244069,"journal":{"name":"52nd Annual Device Research Conference","volume":"79 1","pages":"0"},"PeriodicalIF":0.0000,"publicationDate":"1994-06-20","publicationTypes":"Journal Article","fieldsOfStudy":null,"isOpenAccess":false,"openAccessPdf":"","citationCount":"2","resultStr":"{\"title\":\"4H-silicon carbide mesfet with 2.8 W/mm rf power density\",\"authors\":\"J. Palmour, C. Weitzel, K. Nordquist, C. Carter\",\"doi\":\"10.1109/DRC.1994.1009401\",\"DOIUrl\":null,\"url\":null,\"abstract\":\"Silicon carbide has tremendous potential for high power microwave devices because of its high breakdown electric field (4x106 V/cm), high thermal conductivity (4.9 W/cm-K), high saturated electron drift velocity ( 2 . 0 ~ 107 cm/sec) and low dielectric constant (10.0). The high velocity allows the devices to operate at relatively high frequencies despite the low mobility of S i c . The high breakdown field allows about ten times higher voltages to be applied for a given channel doping, which should allow a much higher output power density to be achieved than with Si or GaAsl . Submicron MESFETs have been previously fabricated in 6H-Sic and have shown desirable microwave performance with RF output powers of about 1 W/mm at 1-2 G H Z ~ ~ ~ . However, another polytype, 4H-SiC, shows even more potential for high power, high frequency operation, because its electron mobility (>550 cm2/V-sec) is about twice that of 6H-Sic. Thus we report the first DC, S-parameter, and output power results obtained with 4H-Sic MESFETs.\",\"PeriodicalId\":244069,\"journal\":{\"name\":\"52nd Annual Device Research Conference\",\"volume\":\"79 1\",\"pages\":\"0\"},\"PeriodicalIF\":0.0000,\"publicationDate\":\"1994-06-20\",\"publicationTypes\":\"Journal Article\",\"fieldsOfStudy\":null,\"isOpenAccess\":false,\"openAccessPdf\":\"\",\"citationCount\":\"2\",\"resultStr\":null,\"platform\":\"Semanticscholar\",\"paperid\":null,\"PeriodicalName\":\"52nd Annual Device Research Conference\",\"FirstCategoryId\":\"1085\",\"ListUrlMain\":\"https://doi.org/10.1109/DRC.1994.1009401\",\"RegionNum\":0,\"RegionCategory\":null,\"ArticlePicture\":[],\"TitleCN\":null,\"AbstractTextCN\":null,\"PMCID\":null,\"EPubDate\":\"\",\"PubModel\":\"\",\"JCR\":\"\",\"JCRName\":\"\",\"Score\":null,\"Total\":0}","platform":"Semanticscholar","paperid":null,"PeriodicalName":"52nd Annual Device Research Conference","FirstCategoryId":"1085","ListUrlMain":"https://doi.org/10.1109/DRC.1994.1009401","RegionNum":0,"RegionCategory":null,"ArticlePicture":[],"TitleCN":null,"AbstractTextCN":null,"PMCID":null,"EPubDate":"","PubModel":"","JCR":"","JCRName":"","Score":null,"Total":0}
引用次数: 2
摘要
碳化硅具有高击穿电场(4x106 V/cm)、高导热系数(4.9 W/cm- k)、高饱和电子漂移速度(2。0 ~ 107 cm/sec)和低介电常数(10.0)。高速度允许器件在相对高的频率下工作,尽管低迁移率的超导。高击穿场允许对给定通道掺杂施加大约十倍高的电压,这应该允许比Si或GaAsl实现更高的输出功率密度。亚微米mesfet先前已在6H-Sic中制造,并显示出理想的微波性能,在1-2 G H Z下RF输出功率约为1 W/mm。然而,另一种多型,4H-SiC,显示出更大的潜力,高功率,高频工作,因为它的电子迁移率(bbb5050cm2 /V-sec)大约是6H-Sic的两倍。因此,我们报告了用4H-Sic mesfet获得的第一个直流、s参数和输出功率结果。
4H-silicon carbide mesfet with 2.8 W/mm rf power density
Silicon carbide has tremendous potential for high power microwave devices because of its high breakdown electric field (4x106 V/cm), high thermal conductivity (4.9 W/cm-K), high saturated electron drift velocity ( 2 . 0 ~ 107 cm/sec) and low dielectric constant (10.0). The high velocity allows the devices to operate at relatively high frequencies despite the low mobility of S i c . The high breakdown field allows about ten times higher voltages to be applied for a given channel doping, which should allow a much higher output power density to be achieved than with Si or GaAsl . Submicron MESFETs have been previously fabricated in 6H-Sic and have shown desirable microwave performance with RF output powers of about 1 W/mm at 1-2 G H Z ~ ~ ~ . However, another polytype, 4H-SiC, shows even more potential for high power, high frequency operation, because its electron mobility (>550 cm2/V-sec) is about twice that of 6H-Sic. Thus we report the first DC, S-parameter, and output power results obtained with 4H-Sic MESFETs.