N. Zikrillayev, M. M. Shoabdurahimova, T. Kamilov, A. Z. Khusanov, K. K. Kurbonaliev, N. Norkulov, E. Saitov
{"title":"用扩散法在硅衬底上获得硅化锰薄膜","authors":"N. Zikrillayev, M. M. Shoabdurahimova, T. Kamilov, A. Z. Khusanov, K. K. Kurbonaliev, N. Norkulov, E. Saitov","doi":"10.26577/phst.2022.v9.i2.011","DOIUrl":null,"url":null,"abstract":"","PeriodicalId":321102,"journal":{"name":"Physical Sciences and Technology","volume":"26 7","pages":"0"},"PeriodicalIF":0.0000,"publicationDate":"2022-12-01","publicationTypes":"Journal Article","fieldsOfStudy":null,"isOpenAccess":false,"openAccessPdf":"","citationCount":"1","resultStr":"{\"title\":\"Obtaining manganese silicide films on a silicon substrate by the diffusion method\",\"authors\":\"N. Zikrillayev, M. M. Shoabdurahimova, T. Kamilov, A. Z. Khusanov, K. K. Kurbonaliev, N. Norkulov, E. Saitov\",\"doi\":\"10.26577/phst.2022.v9.i2.011\",\"DOIUrl\":null,\"url\":null,\"abstract\":\"\",\"PeriodicalId\":321102,\"journal\":{\"name\":\"Physical Sciences and Technology\",\"volume\":\"26 7\",\"pages\":\"0\"},\"PeriodicalIF\":0.0000,\"publicationDate\":\"2022-12-01\",\"publicationTypes\":\"Journal Article\",\"fieldsOfStudy\":null,\"isOpenAccess\":false,\"openAccessPdf\":\"\",\"citationCount\":\"1\",\"resultStr\":null,\"platform\":\"Semanticscholar\",\"paperid\":null,\"PeriodicalName\":\"Physical Sciences and Technology\",\"FirstCategoryId\":\"1085\",\"ListUrlMain\":\"https://doi.org/10.26577/phst.2022.v9.i2.011\",\"RegionNum\":0,\"RegionCategory\":null,\"ArticlePicture\":[],\"TitleCN\":null,\"AbstractTextCN\":null,\"PMCID\":null,\"EPubDate\":\"\",\"PubModel\":\"\",\"JCR\":\"\",\"JCRName\":\"\",\"Score\":null,\"Total\":0}","platform":"Semanticscholar","paperid":null,"PeriodicalName":"Physical Sciences and Technology","FirstCategoryId":"1085","ListUrlMain":"https://doi.org/10.26577/phst.2022.v9.i2.011","RegionNum":0,"RegionCategory":null,"ArticlePicture":[],"TitleCN":null,"AbstractTextCN":null,"PMCID":null,"EPubDate":"","PubModel":"","JCR":"","JCRName":"","Score":null,"Total":0}