氯化铵缓冲溶液对Mos2薄膜光电化学(PEC)电池及光学性能的影响

O. I. Olusola
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引用次数: 0

摘要

采用电沉积生长技术,在氯化铵(NH4Cl)缓冲液和不加氯化铵缓冲液的情况下,成功地合成了厚度约为290 nm的二硫化钼(MoS2)薄膜。实验结果表明,NH4Cl缓冲溶液对电沉积MoS2 (ED - MoS2)薄膜的光电化学(PEC)电池和光学性能有明显的影响。在暗测条件下,用NH4Cl缓冲液制备的MoS2薄膜的电子性能优于不加缓冲液制备的MoS2薄膜。加缓冲液和不加缓冲液制备样品的开路电压分别为~0.556 V和~0.382 V。经缓冲液处理的MoS2的最大功率(Pmax)为0.710 mW,而未经缓冲液处理的MoS2的最大功率(Pmax)为0.258 mW。两种材料的电导率类型不同,可能是由于电解液中氯的影响。光学结果表明,两种材料的能带隙相似,差异较小。在相同的情况下,两种MoS2薄膜的光学导电性相同,但有缓冲溶液制备的MoS2薄膜比没有缓冲溶液制备的MoS2薄膜具有更高的数量级。这些初步结果表明,使用含有NH4Cl缓冲液的电解浴可以开发/沉积更高效的光伏应用MoS2薄膜。
本文章由计算机程序翻译,如有差异,请以英文原文为准。
Influence of Ammonium Chloride Buffer Solution on the Photo-Electro-Chemical (PEC) Cell and Optical Performance of Mos2 Thin Films
Thin films of molybdenum disulphide (MoS2) of approximately same thickness of 290 nm have been successfully synthesized with and without ammonium chloride (NH4Cl) buffer solution using electrodeposition growth technique. The experimental results obtained showed that NH4Cl buffer solution has an obvious effect on the photo-electro-chemical (PEC) cell and optical performance of electrodeposited MoS2 (ED – MoS2) thin films. The MoS2 thin films prepared from NH4Cl buffer solution possess better electronic properties than the ones prepared without the buffer when measured under dark condition. Open circuit voltage of   ~0.556 V and ~0.382 V were obtained for samples prepared with and without a buffer solution respectively. MoS2 from buffer solution had higher maximum power (Pmax) of 0.710 mW while the ones without a buffer solution had a Pmax value of 0.258 mW Also, both materials showed different electrical conductivity type possibly due to the influence of chlorine in the prepared electrolytic bath. The optical results revealed similarity in the energy band gaps of both materials with a little variation. In the same vein, both MoS2 thin films showed optical conductivity of same order but MoS2 thin films prepared with buffer solution have higher magnitude than the ones without a buffer solution. These preliminary results revealed that more efficient MoS2 films for photovoltaic application can be developed / deposited using an electrolytic bath containing NH4Cl buffer.
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