{"title":"恒电流应力和斜电流应力的电荷击穿相关性,以及对超薄栅极氧化物的影响","authors":"N. A. Dumin","doi":"10.1109/IRWS.1997.660288","DOIUrl":null,"url":null,"abstract":"Charge-to-breakdown (Q/sub BD/) is one of the parameters that is used as a measure of oxide quality. In this work, the influence of the measurement conditions on Q/sub BD/ is examined, as well as the relationship between Q/sub BD/ and oxide thickness. Using oxides ranging from 45 /spl Aring/ to 80 /spl Aring/, two Q/sub BD/ measurement methods are employed: constant current stress and exponential current ramp. A variety of current densities (for the constant current stress) and delay times (for the exponential current ramp) are studied. It is shown that not only does Q/sub BD/ depend on oxide thickness, but that Q/sub BD/ depends strongly on the measurement conditions, and that depending on the test conditions, Q/sub BD/ can increase or decrease as the oxide thickness decreases. It is also shown that there is a strong agreement between the Q/sub BD/ measured with a constant current stress and the Q(BD) measured with an exponential current ramp. Finally, the equipment-related limitations of the exponential current ramp are discussed, as well as the impact these limitations have on the underestimation of the resulting Q/sub BD/.","PeriodicalId":193522,"journal":{"name":"1997 IEEE International Integrated Reliability Workshop Final Report (Cat. No.97TH8319)","volume":"201 1","pages":"0"},"PeriodicalIF":0.0000,"publicationDate":"1997-10-13","publicationTypes":"Journal Article","fieldsOfStudy":null,"isOpenAccess":false,"openAccessPdf":"","citationCount":"4","resultStr":"{\"title\":\"Correlation of charge-to-breakdown obtained from constant current stresses and ramped current stresses, and the implications for ultra-thin gate oxides\",\"authors\":\"N. A. Dumin\",\"doi\":\"10.1109/IRWS.1997.660288\",\"DOIUrl\":null,\"url\":null,\"abstract\":\"Charge-to-breakdown (Q/sub BD/) is one of the parameters that is used as a measure of oxide quality. In this work, the influence of the measurement conditions on Q/sub BD/ is examined, as well as the relationship between Q/sub BD/ and oxide thickness. Using oxides ranging from 45 /spl Aring/ to 80 /spl Aring/, two Q/sub BD/ measurement methods are employed: constant current stress and exponential current ramp. A variety of current densities (for the constant current stress) and delay times (for the exponential current ramp) are studied. It is shown that not only does Q/sub BD/ depend on oxide thickness, but that Q/sub BD/ depends strongly on the measurement conditions, and that depending on the test conditions, Q/sub BD/ can increase or decrease as the oxide thickness decreases. It is also shown that there is a strong agreement between the Q/sub BD/ measured with a constant current stress and the Q(BD) measured with an exponential current ramp. Finally, the equipment-related limitations of the exponential current ramp are discussed, as well as the impact these limitations have on the underestimation of the resulting Q/sub BD/.\",\"PeriodicalId\":193522,\"journal\":{\"name\":\"1997 IEEE International Integrated Reliability Workshop Final Report (Cat. No.97TH8319)\",\"volume\":\"201 1\",\"pages\":\"0\"},\"PeriodicalIF\":0.0000,\"publicationDate\":\"1997-10-13\",\"publicationTypes\":\"Journal Article\",\"fieldsOfStudy\":null,\"isOpenAccess\":false,\"openAccessPdf\":\"\",\"citationCount\":\"4\",\"resultStr\":null,\"platform\":\"Semanticscholar\",\"paperid\":null,\"PeriodicalName\":\"1997 IEEE International Integrated Reliability Workshop Final Report (Cat. No.97TH8319)\",\"FirstCategoryId\":\"1085\",\"ListUrlMain\":\"https://doi.org/10.1109/IRWS.1997.660288\",\"RegionNum\":0,\"RegionCategory\":null,\"ArticlePicture\":[],\"TitleCN\":null,\"AbstractTextCN\":null,\"PMCID\":null,\"EPubDate\":\"\",\"PubModel\":\"\",\"JCR\":\"\",\"JCRName\":\"\",\"Score\":null,\"Total\":0}","platform":"Semanticscholar","paperid":null,"PeriodicalName":"1997 IEEE International Integrated Reliability Workshop Final Report (Cat. No.97TH8319)","FirstCategoryId":"1085","ListUrlMain":"https://doi.org/10.1109/IRWS.1997.660288","RegionNum":0,"RegionCategory":null,"ArticlePicture":[],"TitleCN":null,"AbstractTextCN":null,"PMCID":null,"EPubDate":"","PubModel":"","JCR":"","JCRName":"","Score":null,"Total":0}
Correlation of charge-to-breakdown obtained from constant current stresses and ramped current stresses, and the implications for ultra-thin gate oxides
Charge-to-breakdown (Q/sub BD/) is one of the parameters that is used as a measure of oxide quality. In this work, the influence of the measurement conditions on Q/sub BD/ is examined, as well as the relationship between Q/sub BD/ and oxide thickness. Using oxides ranging from 45 /spl Aring/ to 80 /spl Aring/, two Q/sub BD/ measurement methods are employed: constant current stress and exponential current ramp. A variety of current densities (for the constant current stress) and delay times (for the exponential current ramp) are studied. It is shown that not only does Q/sub BD/ depend on oxide thickness, but that Q/sub BD/ depends strongly on the measurement conditions, and that depending on the test conditions, Q/sub BD/ can increase or decrease as the oxide thickness decreases. It is also shown that there is a strong agreement between the Q/sub BD/ measured with a constant current stress and the Q(BD) measured with an exponential current ramp. Finally, the equipment-related limitations of the exponential current ramp are discussed, as well as the impact these limitations have on the underestimation of the resulting Q/sub BD/.