恒电流应力和斜电流应力的电荷击穿相关性,以及对超薄栅极氧化物的影响

N. A. Dumin
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引用次数: 4

摘要

电荷击穿率(Q/sub BD/)是用来衡量氧化物质量的参数之一。本文研究了测量条件对Q/sub - BD/的影响,以及Q/sub - BD/与氧化物厚度的关系。使用范围从45 /spl / ~ 80 /spl /的氧化物,采用了两种Q/sub / BD/测量方法:恒流应力和指数电流斜坡。研究了各种电流密度(恒电流应力)和延迟时间(指数电流斜坡)。结果表明,Q/sub BD/不仅与氧化层厚度有关,而且与测量条件有很强的相关性,并且在不同的测试条件下,Q/sub BD/随氧化层厚度的减小而增大或减小。在恒流应力下测得的Q/sub BD/与在指数电流斜坡下测得的Q(BD)之间有很强的一致性。最后,讨论了与设备相关的指数电流斜坡的限制,以及这些限制对所产生的Q/sub BD/的低估的影响。
本文章由计算机程序翻译,如有差异,请以英文原文为准。
Correlation of charge-to-breakdown obtained from constant current stresses and ramped current stresses, and the implications for ultra-thin gate oxides
Charge-to-breakdown (Q/sub BD/) is one of the parameters that is used as a measure of oxide quality. In this work, the influence of the measurement conditions on Q/sub BD/ is examined, as well as the relationship between Q/sub BD/ and oxide thickness. Using oxides ranging from 45 /spl Aring/ to 80 /spl Aring/, two Q/sub BD/ measurement methods are employed: constant current stress and exponential current ramp. A variety of current densities (for the constant current stress) and delay times (for the exponential current ramp) are studied. It is shown that not only does Q/sub BD/ depend on oxide thickness, but that Q/sub BD/ depends strongly on the measurement conditions, and that depending on the test conditions, Q/sub BD/ can increase or decrease as the oxide thickness decreases. It is also shown that there is a strong agreement between the Q/sub BD/ measured with a constant current stress and the Q(BD) measured with an exponential current ramp. Finally, the equipment-related limitations of the exponential current ramp are discussed, as well as the impact these limitations have on the underestimation of the resulting Q/sub BD/.
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